Research Cleanroom Equipment
PECVD (Oxford 80+)
The PECVD system Plasmalab 80 Plus (produced by Oxford Instruments Plasma Technology, UK) is a 13.56 MHz driven parallel plate reactor with manual sample loading and a heated substrate electrode. It can be used for deposition of Si, SiO2 and Si3N4 films on substrates of any shape and the sizes.
Technical information| Wafer diameter | Up to 240 mm, optimized for 100 mm | |
| Process gases | SiH4, N2O, NH3, N2, He, CH4 | |
| Non-uniformity over 100 mm | <5 % | |
| Working pressure range | 100 - 2000 mTorr | |
| Substrate temperature | 100 - 380°C | |
| RF power | 10 - 300 W | |
| Typical deposition rate of: | α-Si | 9 nm/min |
| SiO2 | 65 nm/min | |
| Si3N4 | 25 nm/min | |
