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b) selective layer-by-layer technique using polyelectrolytes

     We utilize the patterned layer-by-layer thin film technique to develop many new applications in the field of polymer based opto-electronic devices, such as light emitting device (LED), electrochromatic coatings, and conductive polymer patterns on surface for electronic circuits, in which it is required to pattern the films to form micrometer-scale features.  Many of the more common means of forming patterned films, such as photolithography, rely on the use of highly efficient photochemistry and can involve multiple processing steps.  We have a new approach to patterning these systems in situ, using the concept of selective deposition of polyions onto chemically patterned regions of a substrate.  Prior to assembly of the polyion films, sections of gold-coated silicon wafers were chemically patterned with the COOH- terminated thiols and EG-terminated thiol using micro-contact printing just before multilayer deposition, as described above

Figure 3. Micropatterned polyelectrolyte multilayer platforms.  The thickness linearly corresponds to the number of bilayers.  The bilayer thickness is 3.1 nm.


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