grotjohnTimothy Grotjohn, Professor and Chairperson top
Michigan State University
Department of Electrical & Computer Engineering
2120 Engineering Building, East Lansing, MI 48824

Office: 2120 Engineering Bldg.
Phone: 517-353-8906 & 517-432-7127




Curriculum Vitae






Withrow Exceptional Service Award, College of Engineering, Michigan State University, 2005.
Withrow Distinguished Scholar Award, College of Engineering, Michigan State University, 2004.
Withrow Excellence in Teaching Award, Electrical & Computer Engineering, College of Engineering, Michigan State University, 2002.


Ph.D., Electrical Engineering, Purdue University, 1986.
M.S., Electrical Engineering, University of Minnesota, 1984.
B.E.E., Electrical Engineering, University of Minnesota, 1982.

Professional Experience:
2007-present     Chairperson, Electrical & Computer Engineering, Michigan State University

2005-2007        Acting Chairperson, Electrical & Computer Engineering, Michigan State University
2000-present     Professor, Electrical & Computer Engineering, Michigan State University
1993-2000        Associate Professor, Electrical Engineering, Michigan State University
1987-1993        Assistant Professor, Electrical Engineering, Michigan State University

IEEE (Senior Member), ASEE, Eta Kappa Nu, Sigma Xi, Phi Kappa Phi, Materials Research Society and American Vacuum Society.

Professional Service Activities:

Elected Member of IEEE Plasma Science and Applications Executive Committee (08-10, 14-16)
Co-Chair, 2009 New Diamond and Nano Carbon Conference, Traverse City, MI
Conference Organizing Committee, 2006 IEEE International Conference on Plasma Science, Traverse City, Michigan. ( Conference Co-Chair).

Curriculum Vitae

2012 - Curriculum Vitae


Selected Publications - See the curriculum vitae (above) for full list of publications.

Select Recent Journal Publications:

1. R. Ramamurti, M. Becker, E. Schuelke, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, "Deposition of thick boron-doped homoepitaxial single crystal diamond by microwave plasma chemical vapor deposition," Diamond and Related Materials, 18, pp. 704-706, 2009.

2. K. W. Hemawan, I. S. Wichman, T. Lee, T. A. Grotjohn and J. Asmussen, "Compact re-entrant microwave cavity applicator for plasma-assisted combustion,"  Rev. Sci. Instrum., 80, 053507, 2009.

3. K. W. C. Lai, J. J. Narendra, N. Xi, J. B. Zhang, T. A. Grotjohn, J. Asmussen, "Development of plasma nanomanufacturing workcell," J. Manufacturing Sci. and Technol.- Trans. ASME, 132, 031003-031011, 2010.

4. D. T. Tran, C. Fansler, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, "Investigation of mask selectivities and diamond etching using microwave plasma-assisted etching," Diamond and Relat. Mater., 19, 778-782, 2010.

5. K.W. Hemawan, T.A. Grotjohn, D.K. Reinhard, and J.Asmussen, "High pressure microwave plasma assisted CVD synthesis of diamond", Diamond and Related Materials 19, 1446-1452, 2010.

6. X. Rao, K. W.  Hemawan, C. Carter, I.Wichman, T. Grotjohn, J. Asmussen, and T.Lee, "Combustion dynamics for energetically enhanced flames using direct microwave energy coupling", Proc. Combust. Inst., 33, 3232-3240, 2011.

7. X. Rao, S. Hammack, C. Carter, T. Grotjohn, J. Asmussen and T. Lee, "Microwave plasma coupled re-ignition of methane and oxygen mixture under auto-ignition temperature," IEEE Trans. Plasma Science, 39, 3307-3313, 2011.

8. Y. J. Gu, J. Lu, T. Grotjohn, T. Schuelke and J. Asmussen, "Microwave plasma reactor design for high pressure and high power density diamond synthesis," Diamond and Related Materials, 24, 210-214, 2012.

9. D. K. Reinhard, D. T. Tran, T. Schuelke, M. F. Becker, T. A. Grotjohn and J. Asmussen, "SiO2 antireflection layers for single-crystal diamond," Diamond and Related Materials, 25, 84-86, 2012.

1. U.S. patent (#8,316,797), Nov. 27, 2012, Microwave plasma reactors, J. Asmussen, T. Grotjohn, D. K. Reinhard, M. Yaran, K. W. Hemawan, M. Becker, D. King, Y. Gu and J. Lu

2. U.S. patent (#7,442,271), October 28, 2008, Miniature microwave plasma torch application and method of use thereof, J. Asmussen, T. Grotjohn, S. Zuo and K. Hemawan.

3. U.S. patent (#7,262,408), Aug. 28, 2007, Process and apparatus for modifying a surface in a work region, J. Asmussen, T. Grotjohn, N. Xi, and T. P. Hogan.

4. U.S. patent (#7,147,810), Drapable diamond thin films and method for the preparation thereof, D. K. Reinhard, J. Asmussen, M. F. Becker, T. A. Grotjohn, T. Schuelke, and R. Booth.

5. U.S. patent (#6,759,808), Microwave stripline applicators, T. A. Grotjohn, J. Asmussen, and A. Wijaya.

6. U.S. patent (#6,890,300), “Implantable microscale pressure sensor system for pressure monitoring and management,” J. Lloyd, T. A. Grotjohn, A. Weber, F. Rosenbaum and G. Goodall.


Dr. Grotjohn's scholarly interests include the modeling, design, diagnostics, and control of plasma-assisted materials processes and processing machines. This work focuses on the use of models, including electromagnetic, plasma dynamic, and plasma chemistry models, for the design and control of microwave plasma reactors used for materials processing. Specific processes studied have included diamond CVD deposition, amorphous carbon deposition, semiconductor etching, and general microwave-generated plasma discharges operated as ion and radical sources. In coor­dination with the modeling studies are plasma diagnostic studies including a variety of techniques including optical emission spectroscopy, laser spectroscopy, Langmuir probes, and millimeter wave resonator diagnostics. Recent work is especially looking at mini- and micro-scale plasma discharges and their application.

Description of research: Research Description

Description of diamond electronics research: Diamond Electronics

Description of diamond related research with Fraunhofer:



ECE 480: "Electrical & Computer Engineering Capstone Design"

Course website:

EE/ECE 476: "Electro-optics"
EE 842: "Quantum Electronics"
EE/PHY 850: "Plasma Physics"
EE 989A: "Plasma Processsing"

Back to top