BIOGRAPHICAL SKETCH
Jes Asmussen
University Distinguished Professor
and The Richard M. Hong Chaired Professor
Electrical and Computer Engineering
Ph: (517)
355-4620
FAX: (517)
353-1980
Email:
asmussen@egr.msu.edu
Education
Ph.D.
M.S.
B.S.
Professional Experience
2003 – present Executive
Director of the
2002 – present The
Richard M. Hong Chaired Professor
2002, (Feb. – Aug.) Guest
Professor of Advanced Technology for Electrical Engineering (Endowed) Chair,
Department of Electrical and
1997 - present University
Distinguished Professor of Electrical and Computer Engineering,
1990 - 2000 Chairperson,
Department of Electrical and Computer Engineering,
1989 - 1990 Acting
Chairperson, Department of Electrical Engineering,
1975 - 1996 Professor,
Department of Electrical Engineering,
1983 - 1984 Acting
Associate Director of Division of Engineering Research,
1973 - 1975 Associate
Chairperson of the Department of Electrical Engineering,
1971 - 1975 Associate
Professor, Department of Electrical Engineering,
1971 Summer Research Associate,
1967 - 1971 Assistant
Professor, Department of Electrical Engineering,
1967 Summer Research Associate, Department
of Electrical Engineering,
1962 - 1967 Research
Assistant, Department of Electrical Engineering,
1960 - 1962 Design
and Development Engineer, Louis Allis Co.,
Technical and Professional Societies
Institute of Electrical and Electronics Engineers
Executive
Committee of the IEEE Plasma Science and Applications (1987-89)
IEEE
Nuclear and Plasma Science Society Administrative Committee (AdCom) (1997-2001)
Phi Eta Sigma
Tau Beta Pi
Eta Kappa Nu
Sigma Xi
American Association for the Advancement of Science
American
AIAA Technical Committee on Electric Propulsion (1987 to
1994)
Materials Research Society
American Vacuum Society
Honors and Awards
The Richard M. Hong Chaired Professor (2002)
Withrow Distinguished Scholar Award,
University Distinguished Professor of Electrical
Engineering,
Distinguished Service Award,
Fellow, Institute of Electrical and Electronics
Engineers (1992)
Distinguished Faculty Award,
Listed in Who's Who in
Editorial Board Membership
Plasma Sources Science and Technology (Institute of
Journal of Physics D: Applied Physics (
Consulting Experience
Kimberly Clark Corporation,
Lear Siegler Corporation,
Snell Environmental Group,
Air Force Research Laboratory, Kirtland Air Force Base,
ARTO Division,
Central Solar Energy Research Corporation,
Center for Industrial and Institutional Development,
University of New Hampshire/Public Service Company,
Regional Systems Services Group, Inc.,
DOE Contract Review (Wind Energy and Appropriate
Technology Grants)
Ayres, Lewis, Norris and May, Inc.,
National Aeronautics and Space Administration,
S.D. Warren Company/Scott Paper Company,
Michigan Resources Corporation,
Mechanical Products, Inc.,
Optic - Electronic Corp,
Consultant to Several
Norton Christensen, Inc.,
Wavemat, Inc.,
Commonwealth Scientific Corp.,
International Business Machines Corp.,
Dow Corning Corp.,
Princeton Scientific Consultants, Inc.,
General Motors Research Laboratories,
Steel Case,
Institute of Advanced Technology,
The Dow Chemical Company,
Lambda Technologies,
Publications
A. Refereed
Journal Publications
1. J. Asmussen and J.B. Beyer, "High
power microwave nonlinear coupling to acoustic resonances in a warm plasma,"
Appl. Phys. Letters, 11, pp. 324‑326,
2. J. Asmussen and J.B. Beyer,
"Microwave scattering from a harmonically resonant rf plasma," J.
Appl. Phys. 39, 6, pp. 2963‑2964, May 1968.
3. J. Asmussen and J.B. Beyer,
"Microwave harmonic generation in a plasma capacitor," IEEE Trans. on
Elect. Devices ED‑16, 1, pp. 19‑29, January 1969.
4. J. Asmussen and Q.H. Lee, "Parametric
amplification in an rf sustained plasma capacitor," Appl. Phys. Letters,
15, pp. 183‑186, September 1969.
5. J. Asmussen, "Comment on
Millimeter-wave generation with plasma devices:
the state of the art," Proc. IEEE 57, 5, pp. 836‑837, May
1969.
6. J. Asmussen and Q.H. Lee, "The
observation of coupling between low-and-high-frequency resonance in a bounded
plasma," Proc. IEEE 57, pp. 2151‑2152, December 1969.
7. R.M. Fredericks and J. Asmussen,
"Excitation of warm plasma, rotationally-symmetric resonances in a
short-gap cavity," Proc. IEEE 59, pp. 315‑317, February 1971.
8. R.M. Fredericks and J. Asmussen,
"Retuning and hysteresis effects of a rf plasma in a variable size
microwave cavity," J. Appl. Physics, 42, pp. 3647‑3649, August 1971.
9. R.M. Fredericks and J. Asmussen, "A
high density resonantly sustained plasma in a variable length cylindrical
cavity," Appl. Phys. Letters, 19, pp. 508‑510,
10. R.M.
Fredericks and J. Asmussen, "A comparison of the low frequency eigenmodes
of a cylindrical plasma with experimental parametrically excited plasmas,"
Phys. of Fluids, 15, pp. 944‑946, May 1972.
11. J.
Asmussen, R. Mallavarpu, J. Hamman, and
12. S.F. Mertz,
J. Asmussen, and M.C. Hawley, "An experimental study of reactions of CO
and H2 in a continuous flow microwave discharge reactor," IEEE
Trans. on Plasma Science, PS‑2, pp. 297‑307, December 1974.
13. J.
Asmussen, P.D. Fisher,
14. S.F. Mertz,
M.C. Hawley, and J. Asmussen, "A kinetic model for the reactions of CO and
H2 to CH4 and C2H2 in a flow
microwave discharge reactor," IEEE Trans. on Plasma Science, PS‑4,
pp. 11‑23, March 1976.
15. J.
Asmussen, O. Krauss, G.L. Park, and D.E. Linvill, "Application study of
wind power technology to the City of Hart, Michigan, 1977," ERDA Rept.
(C00/2992‑78/1), UC 600, pp. 1-243, January 1978.
16. R. Mallavarpu,
M.C. Hawley, and J. Asmussen, "Behavior of microwave cavity discharge over
a wide range of pressures and flow rates," IEEE Trans. on Plasma Science,
PS‑6, pp. 341‑354, December 1978.
17. J.
Asmussen, D. Manner, and
18.
19. J.
Asmussen, "Wind power--its promises and problems," Copyright 1979,
University of New Hampshire Press/Center for Industrial and Institutional
Development, New Hampshire--also published in Energy Communications, 7, pp. 495‑580,
1982.
20. J. Rogers
and J. Asmussen, "Standing waves along a microwave generated surface wave
plasma," IEEE Trans. on Plasma Science, PS‑10, pp. 11‑16,
March 1982.
21. R. Chapman,
J. Filpus, T. Morin, R. Snellenberger, J. Asmussen, M.C. Hawley, and R. Kerber,
"Microwave plasma generation of hydrogen atoms for rocket
propulsion," J. of Spacecraft and Rockets, 19, pp. 579‑585, December
1982.
22. M. Brake,
J. Hinkle, J. Asmussen, M.C. Hawley, and R. Kerber, "Dissociation and recombination of oxygen atoms produced in
a microwave discharge. Part I: Experiment," Plasma Chemistry and Plasma
Processing, 3, pp. 63‑78, 1983.
23. J. Asmussen
and J. Root, "Characteristics of a microwave plasma disk ion source,"
Appl. Phys. Letters. 44, pp. 396‑398,
24. S.
Whitehair, J. Asmussen, and S. Nakanishi, "Demonstration of a new
electrothermal thruster concept," Appl. Phys. Letters, 44, pp. 1014‑1016,
25. M. Brake,
J. Rogers, M. Peters, J. Asmussen, and R. Kerber, "Electron density
measurements of argon surface wave discharges," Plasma Chemistry and
Plasma Processing, 5, pp. 255‑261, 1985.
26. J. Root and
J. Asmussen, "Experimental performance of a microwave cavity, plasma disk
ion source," Rev. of Sci. Inst, 56, pp. 1511‑1519, 1985.
27. M. Dahimene
and J. Asmussen, "The Performance of a microwave ion source immersed in a
multicusp static magnetic field," J. Vac. Sci. Technol. B4, pp. 126‑130,
1986.
28. T. Roppel,
D.K. Reinhard, and J. Asmussen, "Low temperature oxidation of silicon
using a microwave plasma disk source," J. Vac. Sci. Technol. B4, pp. 295‑298,
1986.
29. S.
Whitehair, J. Asmussen, and S. Nakanishi, "Microwave electrothermal
thruster performance in helium gas," J. of Propulsion and Power, 3, pp.
136-144, 1987.
30. J. Asmussen
and M. Dahimene, "The experimental test of a microwave ion beam source in
oxygen," J. Vac. Sci. Technol. B5, pp. 328‑331, 1987.
31. J.
Asmussen, H.H. Lin, B. Manring, and R. Fritz, "Single mode or controlled
multimode microwave cavity applicators for precision materials
processing," Rev. of Sci. Inst., 58, pp. 1477‑1486, 1987.
32. J. Jow,
M.C. Hawley, M. Finzel, J. Asmussen, H.H. Lin, and B. Manring, "Microwave
processing and diagnosis of chemically reacting materials in a single-mode cavity
applicator," IEEE Trans. on Microwave Theory and Technique, MTT‑35,
pp. 1485-1493, December 1987.
33. L. Mahoney,
M. Dahimene, and J. Asmussen, "A low power, 3.2 cm, efficient microwave
ECR ion source," Rev. of Sci. Inst., 59, pp. 448‑452, 1988.
34. J. Hopwood,
M. Dahimene, D.K. Reinhard, and J. Asmussen, "Plasma etching with a
microwave cavity plasma disk source," J. Vac. Sci. Technol, B6, pp. 268‑271,
1988.
35. L. Frasch,
R. Fritz, and J. Asmussen, "Electrothermal propulsion of spacecraft with
millimeter and submillimeter electromagnetic energy," J. of Propulsion and
Power, 4, pp. 334‑340, 1988.
36. M.C.
Hawley, J. Asmussen, J.W. Filpus, S. Whitehair, T.J. Morin, and R. Chapman,
"A review of research and development on the microwave electrothermal
thruster," J. of Propulsion and Power, 5, pp. 703‑712, 1989.
37. J. Hopwood,
D.K. Reinhard, and J. Asmussen, "Experimental conditions for uniform
anisotropic etching of silicon with a microwave ECR plasma," J. Vac. Sci.
Technol., B6, pp. 1896‑1899, 1988.
38. J.
Asmussen, "Electron cyclotron resonance microwave discharges for etching
and thin film deposition," J. Vac. Sci. Technol, A7, pp. 883‑893,
1989.
39. J. Jow, M.C. Hawley, M.C.
Finzel, and J. Asmussen, "Microwave heating and dielectric diagnosis
technique in a single-mode resonant cavity," Rev. of Sci. Inst., 60, pp.
96‑103, 1989.
40. J. Asmussen, R. Fritz, L.
Mahoney, G. Fournier, and G. DeMaggio, "ECR ion and free radical sources
for MBE applications," Rev. Sci. Inst., 61, pp. 282‑284, 1990.
41. L. Mahoney and J.
Asmussen, "A compact, resonant cavity, five centimeter, multicusp, ECR
broad beam ion source," Rev. Sci. Inst., 61, pp. 285‑287, 1990.
42. J. Asmussen, J. Hopwood,
and F.C. Sze, "A 915 MHz/2.45 GHz ECR plasma source for large area ion beam
and plasma processing," Rev. Sci Inst., 61, pp. 250-252, 1990.
43. J. Hopwood,
D.K. Reinhard, and J. Asmussen, "Charged particle densities and energy
distributions in a multipolar ECR plasma etching source," J. Vac. Sci.
Technol., A8, pp. 3103-3112, 1990.
44. G.T.
Salbert, D.K. Reinhard, and J. Asmussen, "Oxide growth on silicon using a
microwave electron cyclotron resonance oxygen plasma," J. of Vac. Sci. and
Technol., A8, pp. 2919‑2923, 1990.
45. J. Hopwood,
R. Wagner, D.K. Reinhard, and J. Asmussen, "Electric fields in a
microwave-cavity electron-cyclotron resonant plasma source," J. Vac. Sci.
and Technol., A8, pp. 2904‑2908, 1990.
46. J. Zhang,
B. Huang, D.K. Reinhard, and J. Asmussen, "An investigation of the effects
of electromagnetic field patterns on microwave plasma diamond thin film
deposition," J. Vac. Sci and Technol., A8, pp. 2124‑2128, 1990.
47. F.C. Sze,
D.K. Reinhard, B. Musson, J. Asmussen, and M. Dahimene, "Experimental
performance of a large diameter multipolar microwave plasma disk reactor,"
J. Vac Sci. and Technol., B8, pp. 1759-1762, 1990.
48. J.
Engemann, H. Keller, D.K. Reinhard, B. Huang, and J. Asmussen, "Dual-side
contact formation on isolated diamond films," Appl. Phy. Lett. 57, pp.
2461-2463, 1990.
49. J. Hopwood
and J. Asmussen, "Neutral gas temperatures in a multipolar electron
cyclotron resonance plasma," Appl. Phy. Lett. 58, pp. 2473-2495, 1991.
50. B. Musson,
F.C. Sze, D.K. Reinhard, and J. Asmussen, "Anisotropic etching of
submicron features in a 25 cm diameter microwave multicusp ECR plasma
reactor," J. of Vac. Sci. and Technol., B9, pp. 3521-3525, 1991.
51. A.K.
Srivastava, M. Dahimene, T. Grotjohn, and J. Asmussen, "Experimental
characterization of a compact ECR ion source," Rev. Sci. Instrum., 63, pp.
2556-2558, 1992.
52. G. King,
F.C. Sze, P. Mak, T. Grotjohn, and J. Asmussen, "Ion and neutral energies
in a multipolar ECR plasma source," J. of Sci. and Technol., A10, pp.
1265-1269, 1992.
53. P. Mak, G.
King, T. Grotjohn, and J. Asmussen, "Investigation of the influence of
electromagnetic excitation on ECR discharge properties," J. of Vac. Sci.
and Technol., A10, pp. 1281-1287, 1992.
54. B. Huang,
D.K. Reinhard, and J. Asmussen, "Electrical properties of undoped
large-grain and small-grain diamond films," Diamond and Related Materials,
2, pp. 812-815, 1993.
55. J. Bansky,
D. Bartley, J. Engemann, J. Asmussen, E. Case, and S. Connery, "Mechanical
characteristics of hybrid multilayer green tapeTM ceramics sintered
in a 2.45 GHz single mode microwave cavity," Scripta Metallurgia et
Materiala, 28, pp. 785-790, 1993.
56. F.C. Sze
and J. Asmussen, “Experimental scaling laws for ECR plasma sources,” J. of Vac.
Sci. and Technol., A11, pp. 1289-1295, 1993.
57. A.K.
Srivastava and J. Asmussen, "Comparison of the operational performance of
a compact ECR plasma source at excitation frequencies of 2.45 GHz and 915
MHz" J. of Vac. Sci. and Technol., A11, pp. 1307-1312, 1993.
58. E.B.
Manring and J. Asmussen, "Energy and power orthogonality in isotropic, discretely
inhomogeneous waveguides," IEEE Microwave and Guided Wave Letters, 3, pp.
75-76, 1993.
59. E.B.
Manring and J. Asmussen, "Useful bessel function identities and
integrals," IEEE Trans. on Microwave Theory and Techniques, 41, pp.
1468-1476, 1993.
60. S.D. Chen,
R.Y. Ofoli, E.P. Scott and J. Asmussen, "Volatile retention in microwave
freeze - dried model foods," Journal of Food Science, 58, 1-5, 1993.
61.
J. Wei, M. Hawley
and J. Asmussen, “Microwave power absorption model for composite processing in
a resonant cavity,” J. Microwave Power and Electromagnetic Energy, 28, 234-246
1993.
62. A.K.
Srivastava, J. Asmussen, T. Antaya and K. Harrison, "The study of a 2.45
GHz plasma source as a plasma generator for the SCECR Electron Cyclotron Ion
Source,” Rev. Sci. Instrum., 65, pp. 1135-1137, 1994.
63. A.K.
Srivastava, D. Sze and J. Asmussen, "Discharge characteristics of a five
centimeter, multipolar ECR ion source," Rev. Sci. Instrum., 65, pp.
1749-1752, 1994.
64. J. Asmussen
and P. Mak, "Control of multipolar electron cyclotron resonance discharges
using internal cavity impedance matching," Rev. of Sci. Instrum., 65, pp.
1753-1756, 1994.
65. T.A.
Grotjohn, V. Gopinath, A.K. Srivastava and J. Asmussen, "Modeling the
electromagnetic excitation of a compact ECR ion/free radical source," Rev.
Sci. Instrum., 65, pp. 1761-1765, 1994.
66. A.K.
Srivastava and J. Asmussen, “Measurements of the impressed electric field
inside a coaxial electron cyclotron resonance plasma source,” Rev. Sci.
Instrum., 66, pp. 1028-1034, 1995.
67. G.S. Yang,
M. Aslam, K.P. Kuo, D.K. Reinhard and J. Asmussen, "Effect of ultra high
nucleation density on diamond growth at different growth rates and
temperatures," J. Vac. Sci. Technol. B13, pp. 1030-1036, 1995.
68. J. Asmussen
and
69. P. Mak,
M.-H. Tsai, J. Natarajan, B.L. Wright, T.A. Grotjohn, F.M.A. Salam, M. Siegel
and J. Asmussen, "Investigation of multipolar electron cyclotron resonance
plasma source sensors and models for plasma control," J. Vac. Sci. and
Technol. A14, pp. 1894-1900, 1996.
70. F. M. Salam
,C. Piwek, G. Erten, T. Grotjohn and J. Asmussen, "Modeling of a plasma
processing machine for semiconductor wafer etching using energy-functions-based
neural networks," IEEE Trans. on Control System Technology, 5, pp.
598-613, 1997.
71. P. Mak and
J. Asmussen, "The experimental investigation of the matching and impressed
electric field of a multipolar electron cyclotron resonance discharge," J.
Vac. Sci. and Technol., A15, pp. 154-168, 1997.
72. K.Y. Lee,
E.D. Case, J. Asmussen and M. Siegel, "Binder burn-out in a controlled
single-mode microwave cavity," Scripta Materialla, 35, pp. 107-111, 1996.
73. K.P. Kuo
and J. Asmussen, “An experimental study of high pressure synthesis of diamond
films using a microwave cavity plasma reactor,” Diamond and Related Materials,
6, pp. 1097-1105, 1997.
74. J.
Asmussen, T. Grotjohn, P. Mak and M. Perrin, “The design and application of
electron cyclotron resonance discharges,” Invited Paper, for the 25th
anniversary edition of the IEEE Trans.
on Plasma Science, PS-25, pp. 1196-1221, 1997.
75. K.Y. Lee,
E.D. Case and J. Asmussen, “The steady-state temperature as a function of
casket geometry for microwave-heated refractory caskets,” Mat. Res. Innovat.,
1, pp. 101-116, 1997.
76. J. Asmussen, J. Mossbrucker, S. Khatami, W.S. Huang, B. Wright and V. Ayres, “The effect of nitrogen on the growth, morphology, and crystalline quality of MPACVD diamond films,” Diamond and Related Materials, 8, pp. 220-225, 1999.
77.
J. Mossbrucker and
J. Asmussen, “3-D determination of the location and absolute amount of sp2
and sp3 bound carbon and stress components in CVD diamond films
using multi-color polarized Raman spectroscopy,” Diamond and Related Materials,
8, pp. 663-667, 1999.
78.
T.A. Grotjohn, J.
Asmussen , J. Sivagnaname, D. Story, A.L. Vikharev, A. Gorbachev, and A.
Kolysko, “Electron density in moderate pressure diamond deposition discharges,”
Diamond and Related Materials, 9, pp. 322-327, 2000.
79.
V.M. Ayres, T.R.
Bieler, M.G. Kanatzidis, J. Spano, S. Hagopian, H. Balhareth, B.F. Wright, M.
Farhan, J. Abdul Majeed, D. Spach, B.L. Wright, and J. Asmussen, “The effect of
nitrogen on competitive growth mechanisms of diamond thin films,” Diamond and
Related Materials, 9, pp. 236-240, 2000.
80.
J.K. Park, V.M.
Ayres, J. Asmussen, and K. Mukherjee, “Precision micromachining of CVD diamond
films,” Diamond and Related Materials, 9, pp. 1154-1158, 2000.
81.
V.M. Ayres, M.
Farhan, D. Spach, J. Bobbitt, J. Abdal Majeed, B.F. Wright, B.L. Wright, J.
Asmussen, M. Kanatzidis and T.R. Bieler, “Transitions observed in
nitrogen/methane/hydrogen depositions of polycrystalline diamond films,” J. Appl.
Phys , 89, pp. 6062-6068, 2001.
82.
B. Bi, W.-S. Huang,
J. Asmussen and B. Golding, “Surface acoustic waves on nanocrystalline
diamond,” Diamond and Related Materials, 11, pp. 677-680, 2002.
83.
A. L. Vikharev, A.
M. Gorbachev, V. A. Koldanov, R. A. Akmedzhanov, D.B. Radishchev, T. A.
Grotjohn, S. Zuo, and J. Asmussen, “Comparison of pulsed and CW regimes of
MPACVD reactor operation,” Diamond and Related Materials, 12, 272-276, 2003.
84.
T. Ohshina, T.
Ikegami, K. Ebihara, J. Asmussen, R. Thareja, “Synthesis of p-type ZnO thin
films using co-doping techniques based on KrF excimer laser deposition,” Thin
Solid Films. 435, 49-55. 2003.
85.
D. K. Reinhard, T.
A. Grotjohn, M. Becker, M. K. Yarn, T. Schuelke, and J. Asmussen, “Fabrication
and properties of ultranano, nano, and microcrystalline diamond membranes and
sheets,” The Journal of Vacuum Science & Technology, B15, pp. 2811-2817,
2004.
86.
T. Grotjohn, R.
Liske, K. Hassouni, and J. Asmussen, “Scaling behavior of microwave reactors
and discharge size for diamond deposition,” Diamond and Related Materials, 14,
288-291, 2005.
87.
88.
S. Ahmed, R. Liske,
T. Wunderer, M. Leonhardt, R. Ziervogel, C. Fansler, T. Grotjohn, J. Asmussen,
and T. Schuelke, “Extending the three-omega method to the MHz range for thermal
conductivity measurements of diamond thin films,” Diamond and Related
Materials, 15, 389-393, 2006.
89.
K. W. Hemawan, C.
L. Romel, S. Zuo,
90.
D. T. Tran, W.-S.
Huang, J. Asmussen, T. A. Grotjohn, and D. Reinhard, “Synthesis of
ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor
deposition,” accepted as an invited paper for the special issue (nanocrystalline
diamond) of New Diamond and Frontier Carbon Technology,
91.
S.S. Zuo, M. K.
Yaran, T.A. Grotjohn, D.K. Reinhard, and J. Asmussen, “Investigation of diamond
deposition uniformity and quality for freestanding film and substrate
applications,” submitted to Diamond and Related Materials 2007.
B. Conference Papers & Proceedings
(International & National Meetings)
(*Denotes
a paper that was both delivered at a conference and appeared in a reviewed
conference proceedings)
1. J. Asmussen and J.B. Beyer,
"Microwave harmonic generation in a plasma capacitor," presented at
Int'l Electron Devices Meeting,
2. J. Asmussen and Q.H. Lee, "Parametric
amplification and frequency modulation in a microwave sustained plasma
capacitor," presented at the fall USNC-URSI Meeting, Int'l IEEE/G-AP
Symp.,
3. Q.H. Lee and J. Asmussen, "The
experimental impedance of a plasma in resonance," Bull. Am. Phys. Soc.,
15, pp. 1496, November 1970.
4. R.M. Fredericks and J. Asmussen, "An
experimental study of a resonantly sustained, bounded plasma located inside
microwave cavities," Bull. Am. Phys. Soc., 15, pp. 1469, November 1970.
5. J. Asmussen, Q.H. Lee, and P.L. Colestock,
"An experimental study of cold plasma and temperature resonances at high rf
power," presented at Fall USNC/URSI Meeting, Int'l IEEE/G-AP,
6. R.M. Fredericks and J. Asmussen,
"Excitation of a dense resonantly sustained plasma in a cylindrical
cavity," Bull. Amer. Phys. Soc., 16, pp. 1228, November 1971.
7.* J. Asmussen, M.C. Hawley, R. Mallavarpu, and
S. Mertz, "Behavior of a bounded plasma inside a microwave cavity at high
and low pressures," Proc. of the
Second Topical Conference on RF Plasma Heating, Lubbock, TX, pp. c4‑1-c4‑5,
June 22, 1974.
8. S. Mertz, M.C. Hawley, and J. Asmussen,
"Kinetic model for reactions of CO and H2 in a flow microwave
discharge reactor," presented at the 2nd Int'l Conf. on Plasma Science,
9. R. Mallavarpu, M.C. Hawley, and J. Asmussen,
"An experimental study of rf waves and instabilities in a lossy bounded
plasma," presented at the 2nd Int'l Conf. on Plasma Science,
10.* J. Asmussen,
"Wind system research project for the City of Hart, Michigan," presented
at the 2nd Workshop on Wind Energy Conversion Systems Conference Proceedings,
pp. 118‑120, June 9‑11, 1975.
11. J.
Asmussen, "A wind energy conversion system for the City of
12. J.
Asmussen, R. Mallavarpu, and M.C. Hawley, "Power absorption
characteristics of a microwave plasma source," presented at the 1977 IEEE
Int'l Conference on Plasma Science,
13. J.
Asmussen, "The economic and technical feasibility of wind systems for
small municipalities and rural electric cooperatives," Presented at the
Annual Tri-State Region of the American Society of Agricultural Engineers,
14.* J. Asmussen,
"Application study of wind power technology to the City of
15. R. Fritz
and J. Asmussen, "Experimental characteristics of rf surface wave plasma sources,"
presented at the 1979 IEEE International Conference on Plasma Science,
16. J.
Asmussen, R. Fritz, M.C. Hawley, and R. Kerber, "Rf surface wave generated
plasma sources: Their practical application and their limitations,"
presented at the 1979 IEEE International Conference on Plasma Science,
Montreal, Canada, June 4-6, 1979.
17.* W. Stout, P.
Maycock, J. Clark, and J. Asmussen, "Status and prospects of solar energy
technologies," presented at the 46th Annual Meeting of the National
Society of Professional Engineers, July 23, 1981, Detroit, MI, also in the
Conference Proceedings CONF-B00780, Vol. 1, UC‑38, pp. 61‑130,
November 1980.
18. W.T. Rose,
S. Waslawski, J. Asmussen, and W. Stout, "Solar and wind energy feasibility
studies with a programmable calculator," ASAE Energy Symposium,
19.* W.T. Rose,
J. Asmussen, and W. Stout, "Performing life-cycle cost economic analysis
for small wind energy conversion systems with a programmable calculator,"
DOE/University of Missouri-Columbia Conference on Wind Energy Technology,
Kansas City, MO, Conference Proceedings, pp. 1‑7, March 16‑17,
1981.
20.* W.T. Rose,
J. Asmussen, and W. Stout, "A comparison of six methods for calculating the
annual energy output of wind turbines," DOE/University of
Missouri-Columbia Conference on Wind Energy Technology, Kansas City, MO,
Conference Proceedings, pp. 197‑205, March 16‑17, 1981.
21.* J. Root, J.
Rogers, J. Asmussen, and M.C. Hawley, "Fundamental design problems and
properties of microwave plasma/ion sources," presented at AIAA/JSASS/DGLR
15th International Electric Propulsion Conference, Las Vegas, NV, April 21,
1981, also AIAA paper 81-0679.
22.* R. Chapman,
J. Filpus, T. Morin, R. Snellenberger, J. Asmussen, M.C. Hawley, and R. Kerber,
"Microwave plasma generation of hydrogen atoms for rocket
propulsion," presented at AIAA/JSASS/DGLR 15th International Electric
Propulsion Conference, Las Vegas, NV, April 21, 1981, AIAA paper 81‑0675.
23. M. Brake,
J. Hinkle, J. Wareck, R. Kerber, M.C. Hawley, and J. Asmussen, "Microwave
discharge oxygen plasma," presented at AIAA/JSASS/DGLR 15th International
Electric Propulsion Conference,
24. J. Asmussen
and J. Rogers, "The experimental production of microwave plasma filaments
and discharges at high pressure," presented at the 1981 IEEE International
Conference on Plasma Science,
25. J.
Asmussen, "Productibility analysis of a 15 kW WTG," presented at DOE
Small Wind Turbine Systems 1981 Workshop, Boulder, CO, May 12‑14, 1981.
26.* T.
Anuskiewicz, J. Asmussen, and O. Frankenfield, "Analyzing the requirements
for mass production of small wind turbine generators," Proceeding of the
Small Wind Turbine Systems Workshop 1981, SERI/CP‑635‑1212, pp. 107‑121.
27. R. Chapman,
J. Filpus, T. Morin, J. Asmussen, R. Kerber and M.C. Hawley, "Microwave
plasma generation of hydrogen atoms," presented at the 1981 IEEE
International Conference on Plasma Science,
28. J. Asmussen
and J. Rogers, "An assessment of the potential application of microwave
discharges to electrical propulsion engines," presented at the MSU/NASA
Workshop on Advanced Propulsion Concepts Using Time Varying Electromagnetic
Fields,
29. J. Root and
J. Asmussen, "MSU microwave ion source," presented at the MSU/NASA
Workshop on Advanced Propulsion Concepts Using Time Varying Electromagnetic
Fields,
30. J. Rogers
and J. Asmussen, "Properties of steady state, high pressure microwave
generated arc discharges in Argon gas," presented at the 1982 IEEE
International Conference on Plasma Science,
31. J. Asmussen
and J. Rogers, "The behavior of steady-state, low pressure microwave
generated plasmas," presented at the 1982 IEEE International Conference on
Plasma Science, Ottawa, Canada, May 17‑19, 1982.
32.* J. Root and
J. Asmussen, "Performance characteristics of microwave plasma disk ion
source," presented at the AIAA/JSASS/DGLR 16th International Electric
Propulsion Conference, November 17‑19, 1982, also AIAA paper 82‑1935.
33. M.C.
Hawley, T. Morin, R. Chapman, J. Filpus, R. Kerber, and J. Asmussen,
"Measurements of energy distribution and thrust for microwave plasma
coupling of electric energy to hydrogen for propulsion," presented at the
AIAA/JSASS/DGLR 16th International Electric Propulsion Conference, November 17‑19,
1982.
34.* S. Whitehair
and J. Asmussen, "The generation and maintenance of stable high pressure
microwave arcs," presented at the 5th Topical Conference on Radio
Frequency Plasma Heating, Madison, WI, February 21‑23, 1983, also
published in the conference proceeding, Proc. of the 5th Topical Conf. on Radio
Frequency Plasma Heating, pp. 296‑299.
35. M. Brake,
M. Peters, J. Rogers, J. Asmussen, and R. Kerber, "Electron density
measurements of high pressure Argon surface wave plasmas," presented at
the 1983 IEEE International Conference on Plasma Science,
36. J. Asmussen
and J. Root, "Microwave and UHF plasma disk ion source," presented at
the 1983 IEEE International Conference on Plasma Science,
37. J. Asmussen
and S. Whitehair, "Measurements of the electromagnetic field patterns
surrounding atmospheric microwave discharges," presented at the 1983 IEEE
International Conference on Plasma Science,
38.* J. Asmussen,
S. Whitehair, and S. Nakanishi, "Experiments with a microwave
electrothermal thruster concept," presented at the AIAA/JSASS/DGLR 17th
International Electric Propulsion Conference, Tokyo, Japan, May 28‑31,
1984, also Conference Proceedings Paper
IEPC 84‑74.
39.* J. Asmussen
and J. Root, "Recent work on a microwave ion source," presented at
the ALAA/JSASS/DGLR 17th International Electric Propulsion Conference, Tokyo,
Japan, May 28‑31, 1984, also Conference Proceedings Paper IEPC 84-90.
40. J.
Asmussen, S. Whitehair, and S. Nakanishi, "Performance measurements on a
microwave electrothermal engine," presented at the 1984 IEEE International
Conference on Plasma Science,
41.* M. Peters,
J. Rogers, S. Whitehair, J. Asmussen, and R. Kerber, "Spatial electron
density and electric field strength measurements in microwave cavity
experiments," presented at the AIAA 17th Fluid Dynamics and Lasers
Conference, June 25‑27, 1984, AIAA paper AIAA‑84‑1521, pp. 1‑5.
42.* L. Frasch
and J. Asmussen, "Electromagnetic plasma models for microwave plasma
models for microwave plasma cavity reactors," presented at the AIAA 17th Fluid Dynamics and
Lasers Conference, June 25‑27, 1984, AIAA Paper AIAA-84‑1522, pp. 1‑10.
43. M. Dahimene
and J. Asmussen, "The performance of a microwave ion source immersed in a
multicusp static magnetic field" presented at the 29th International
Symposium on Electron, Ion and Photon Beams,
44. T. Roppel,
D.K. Reinhard, and J. Asmussen, "Low temperature native oxidation of
silicon using a microwave plasma disk source," presented at the 29th
International Symposium in Electron, Ion and Photon Beams,
45. J.
Asmussen, "Development of microwave plasma and ion beam sources for
materials processing," Invited paper presented at the 12th IEEE
International Conference on Plasma Science,
46.* L. Frasch
and J. Asmussen, "Electrothermal propulsion of spacecraft with time
varying electromagnetic energy," presented at the AIAA/DGLR/JSASS 18th International
Electric Propulsion Conference, Alexandria, VA, September 30- October 2, 1985,
AIAA paper AIAA‑85‑2050, pp. 1‑14.
47.* S.
Whitehair, J. Asmussen, and S. Nakanishi, "Recent experiments with
microwave electrothermal thrusters," presented at the AIAA/DGLR/JSASS 18th
International Electric Propulsion Conference, Alexandria, VA, September
30-October 2, 1985, AIAA paper AIAA‑85‑2051, pp. 1‑16.
48. J. Asmussen
and M. Dahimene, "The experimental test of a microwave ion beam source in
oxygen," presented at the 30th International Symposium on Electron, Ion
and Photon Beams,
49. M.
Dahimene, J. Root, L. Mahoney, and J. Asmussen, "Characterization of a
microwave generated plasma," presented at the 13th IEEE International
Conference on Plasma Science,
50. S.
Whitehair, L. Frasch, and J. Asmussen, "Experimental investigation of
microwave electrothermal thruster configurations," presented at the 13th
IEEE International Conference on Plasma Science,
51. J. Hopwood,
M. Kubinec, J. Asmussen, and M.L. Brake, "Electronic temperature
measurements of helium microwave discharges," presented at the 39th Annual
Gaseous Electronics Conference,
52.* T. Roppel,
D.K. Reinhard, G.T. Salbert, and J. Asmussen, "Properties of silicon oxide
films grown in a microwave oxygen plasma," presented at the 1986 IEEE
International Electron Devices Meeting, Los Angles, CA, December 7-10, 1986,
also IEEE IEDM Technical Digest, pp. 205, 1986.
53. M.C. Hawley
and J. Asmussen, "Microwave plasma arcjet concept and diagnostics," invited
presentation at the Arcjet Plume Diagnostics Technical Workshop, Jet
Propulsion Laboratory, Pasadena, CA, October 2‑3, 1986.
54.* M. Dahimene,
L. Mahoney, and J. Asmussen, "An electron cyclotron resonant multicusp
magnetic field microwave plasma source for electric propulsion," presented
at the 19th AIAA/DGLR/JSASS International Electric Propulsion Conference, Colorado
Springs, CO, May 11‑13, 1987, AIAA paper AIAA‑87-1015, pp. 1‑10.
55.* L. Frasch,
J.M. Griffin, and J. Asmussen, "An analysis of electromagnetic coupling
and eigenfrequencies for microwave electrothermal thruster discharges,"
presented at the 19th AIAA/DGLR/JSASS International Electric Propulsion
Conference, Colorado Springs, CO, May 11‑13, 1987, AIAA paper IAA‑87‑1012.
56.* S.
Whitehair, L. Frasch, and J. Asmussen, "Experimental performance of a
microwave electrothermal thruster with high temperature nozzle materials,"
presented at the 19th AIAA/DGLR/JSASS International Electric Propulsion
Conference, Colorado Springs, CO, May 11‑13, 1987, AIAA paper AIAA‑87‑1016
pp. 1‑25.
57.* M.C. Hawley,
J. Asmussen, J.W. Filpus, S. Whitehair, and R. Chapman, "A review of
research and development on the microwave-plasma electrothermal rocket,"
presented at the 19th AIAA/DGLR/JSASS International Electric Propulsion
Conference, Colorado Springs, CO, May 11‑13, 1987, AIAA paper AIAA‑87‑1011,
pp. 1‑14.
58. J. Jow, M.
Finzel, J. Asmussen, and M.C. Hawley, "Dielectric and temperature
measurements during microwave curing of epoxy resins in a resonant
cavity," presented at the 1987 IEEE MTT-S International Microwave
Symposium, June 9‑11, 1987.
59. J. Hopwood,
M. Dahimene, D.K. Reinhard, and J. Asmussen, "Plasma etching with a
microwave cavity plasma disk source," presented at the 31st International
Symposium on Electron Ion and Photon Beams at
60. L. Mahoney,
M. Dahimene, and J. Asmussen, "Low power, compact, 2.5 cm, efficient
microwave ion source," presented at the 14th IEEE International Conference
on Plasma Science,
61. M.
Dahimene, L. Mahoney, J. Hopwood, J. Salbert, D.K. Reinhard, and J. Asmussen,
"Comparison of experimental measurements and theoretical modeling of low
pressure microwave discharges," presented at the 14th IEEE International
Conference on Plasma Science,
62. L. Frasch,
S. Whitehair, and J. Asmussen, "High pressure, high temperature microwave
discharges for application in plasma chemistry," presented at the 14th
IEEE International Conference on Plasma Science,
63. J. Jow,
M.C. Hawley, M. Finzel, J. Asmussen, and R. Fritz, "On-line measurement of
temperature - and cure-dependent dielectric properties during single frequency
microwave curing and comparison with thermal curing of epoxy resins,"
presented at the Conference on Emerging Technologies in Materials (AICHE)
64.* J. Asmussen
and D.K. Reinhard, "Applications and characteristics of low pressure
microwave, ECR ion and plasma sources," presented at the International
Conference on ECR Ion Sources, National Superconducting Laboratory, East
Lansing, MI, November 16‑18, 1987, also Conference Proceedings, pp. 479‑490.
65.* L. Mahoney,
J. Engemann, and J. Asmussen, "Performance characteristics of an
efficient, compact 3.2 cm ECR broad-beam ion source operating with high and low
accelerating potentials," presented at the International Conference on ECR
Ion Sources, National Superconducting Laboratory, East Lansing, MI, November 16‑18,
1987, also Conference Proceedings, pp. 101‑111.
66.* J. Hopwood,
J. Asmussen, and D.K. Reinhard, "Anisotropic silicon etching with a
microwave cavity, ECR Plasma Source," presented at the International
Conference on ECR Ion Sources, National Superconducting Laboratory, East
Lansing, MI, November 16‑18, 1987, also Conference Proceedings, pp. 503‑509.
67.* J. Asmussen
and R. Garard, "Precision microwave applicators and systems for plasma and
materials processing," presented at the 1988 Spring Meeting of the
Materials Research Society, Reno, Nevada, April 5-9, 1988, also Materials
Research Society Symposium Proceedings, vol. 124, Microwave Processing of
Materials, Copyright 1988, Materials Research Society, pp. 347‑352.
68. J. Hopwood,
D.K. Reinhard, and J. Asmussen, "Experimental conditions for uniform
anisotropic etching of silicon with a microwave ECR plasma system,"
presented at the 32nd International Symposium on Electron, Ion and Photon
Beams,
69.* J. Asmussen
and S. Whitehair, "Experiments and analysis of a compact microwave
electrothermal thruster," presented at the 20th AIAA/DGLR/JSASS
International Electric Propulsion Conference, Garmish-Partenkirchen, West
Germany,
70. J.
Asmussen, S. Whitehair, M.C. Hawley, and M. Wolak, "Microwave discharges
for spacecraft propulsion," Invited Paper, 23rd Microwave Power
Symposium, International Microwave Power Institute, Ottawa, Canada, August 29‑31,
1988.
71. G.T.
Salbert, J. Hopwood, J. Asmussen, and D.K. Reinhard, "Microwave plasma
oxidation and etching for integrated circuit processing," Invited Paper,
23rd Microwave Power Symposium, International Microwave Power Institute,
Ottawa, Canada, August 29‑31, 1988.
72. J.
Asmussen, J. Hopwood, D.K. Reinhard, and L. Mahoney, "Microwave plasma
applicator design principles for low and high pressure applications," Invited
Paper, 23rd Microwave Power Symposium, International Microwave Power
Institute, Ottawa, Canada, August 29‑31, 1988.
73. J.
Asmussen, "ECR Microwave discharges for etching and thin film
deposition," Invited Paper, 35th National Symposium of the American
Vacuum Society, Atlanta, GA, October 3‑7, 1988.
75. J.
Asmussen, "Microwave applicator theory and application for high
temperature material processing," Invited Paper, presented at 92nd
Annual Meeting of the American Ceramic Society,
74. J.
Asmussen, "Recent developments in microwave plasma and ECR processing
discharges," Invited Paper, 16th Annual Symposium, Michigan Chapter
American Vacuum Society, Dearborn, MI, May 3, 1989.
75. J. Hopwood,
R. Wagner, D.K. Reinhard, and J. Asmussen, "Characterization of a
multipolar electron cyclotron resonance microwave plasma source," 16th
IEEE International Conference in Plasma Science,
76. L. Mahoney
and J. Asmussen, "A compact and low power microwave ECR broad beam ion
source for low pressure materials processing," 16th IEEE International
Conference in Plasma Science, Buffalo, NY, May 22‑24, 1989.
77. G.T.
Salbert, D.K. Reinhard, and J. Asmussen, "Downstream oxidation of silicon
using on ECR microwave plasma disk reactor," 16th IEEE International Conference
on Plasma Science,
78. J.
Asmussen, R. Fritz, L. Mahoney, G. Fournier, and G. DeMaggio, "ECR ion and
free radical sources for MBE applications," presented at the International
Conference on Ion Sources,
79. L. Mahoney
and J. Asmussen, "A compact, resonant cavity, five centimeter, multicusp,
ECR broad beam ion source," presented at the International Conference in
Ion Sources,
80. J.
Asmussen, J. Hopwood, and F.L. Sze, "A 915 MHz/2.45 GHz ECR plasma source
for large area ion beam and plasma processing," presented at the
International Conference on Ion Sources,
81. G.T.
Salbert, D.K. Reinhard, and J. Asmussen, "Oxide growth on silicon using a
microwave electron cyclotron resonance oxygen plasma," presented at the
36th National Symposium of the American Vacuum Society,
82. J. Hopwood,
R. Wagner, D.K. Reinhard, and J. Asmussen, "Optimization of microwave
cavity electric fields in ECR plasmas," presented at the 36th National
Symposium of the American Vacuum Society,
83. J. Zhang,
B. Huang, D.K. Reinhard, and J. Asmussen, "An investigation of the effects
of electromagnetic field patterns on microwave plasma diamond thin film
deposition," presented at the 36th National Symposium of the American
Vacuum Society,
84. J.
Asmussen, "Microwave plasma reactors for diamond thin film
depositions," Invited Paper, 1st Annual Diamond Technology
Workshop, Ins. for Manufacturing Research, Wayne State University, Detroit, MI,
September 18, 1989.
85. J.
Asmussen, "Recent developments in microwave plasma and ECR processing
discharges," Invited Paper, Plasma Etch 1989 Symposium, American
Vacuum Society, Northern California, San Jose, CA, September 21, 1989.
86. J.
Asmussen, "Microwave applicator theory and applications for solid material
and plasma processing," Invited Paper, Microwave Plasma and
Materials Processing Symposium American Vacuum Society, New York Chapter, David
Sarnoff Research Center, Princeton, NJ, November 8, 1989.
87. J.
Asmussen, "Microwave applicator theory and applications for solid material
Processing," Invited Paper, 1st Int. Ceramic Science and Tech.
Congress, American Ceramic Society, Anaheim, CA, October 31-November 3, 1989.
88. J. Hopwood,
D.K. Reinhard, and J. Asmussen, "Performance of multipolar electron
cyclotron resonant microwave cavity plasma sources," the 24th Microwave
Power Symposium,
89. J.
Asmussen, "Microwave applicator theory and applications for solid material
processing," Invited Paper, 1990 Spring Meeting, Materials Research
Society, San Francisco, CA, April 16‑21, 1990.
90. J.
Asmussen, "ECR discharges for plasma etching and thin film
deposition," Invited Paper, 8th Symposium on Plasma Processing,
Electrochemical society,
91. F.C. Sze,
D.K. Reinhard, B. Musson, J. Asmussen, and M. Dahimene, "Experimental
performance for a large diameter multipolar microwave plasma disk
reactor," presented at the 1990 International Symposium on Electron Ion
and Photon Beams at
92. J.
Asmussen, D.K. Reinhard, and T. Grotjohn, "Measured characteristics and
properties of multipolar ECR plasmas," presented at the Washington
Materials Forum,
93. J.
Asmussen, "Microwave applicator theory and application in polymers
processing," Invited Paper, Society of Plastics Engineers Annual
Technical Conference,
94. J.
Asmussen, "ECR technology for low pressure thin film deposition
applications," Invited Paper, International Conference in
Metallurgical Coating and Thin Films, San Diego, CA, April 1991.
95.* B. Manring
and J. Asmussen, "Electromagnetic modeling of a single-mode excited
material loaded applicator," Symposium on Microwaves: Theory and
Applications on Materials Processing, 93rd Annual meeting of the American
Ceramic Society, Cincinnati, OH, April 28, 1991; also Ceramic Transactions, 21,
"Microwave: Theory and Application
in Materials Processing," Ed. Clark, Gae and Sutton, pp. 159-166, 1991.
96.* J. Asmussen,
B. Manring, R. Fritz, and M. Siegel, "Experimental examination of Material
Loaded Cylindrical Applicators and Comparison With Theoretical Model,"
93rd Annual Meeting of the American Ceramic Society, Cincinnati, OH, April 28,
1991; also Ceramic Transactions, 21, "Microwaves: Theory and Applications in Materials
Processing," Ed. Clark, Gac and Sutton, pp. 655-666, 1991.
97.* R. Fritz and
J. Asmussen, "Distribution of dissipated power in a graphite fiber
reinforced epoxy composite in a microwave cavity applicator," 93rd Annual
Meeting of the American Ceramic Society, Cincinnati, OH, April 28, 1991; also
Ceramic Transactions, 21, "Microwaves:
Theory and Application in Materials Processing," Ed. Clark, Gac and
Sutton, pp. 547-556, 1991.
98. B. Musson,
F.C. Sze, D.K. Reinhard, and J. Asmussen, "Anisotropic etching of
sub-micron features in a 25 cm diameter microwave multicusp ECR plasma
reactor," presented at the 1991 International Symposium on Electron Ion
and Photon Beams at
99. F.C. Sze,
J. Hopwood, and J. Asmussen, "Downstream characterization of a 20-cm
diameter, 915 MHz/2.45 GHz multipolar electron-cyclotron resonant plasma
source," et al., 18th IEEE International Conference on Plasma Science,
100. P. Mak, G.
King, J. Hopwood, T. Grotjohn, and J. Asmussen, "Influence of static
magnetic field configuration and EM field pattern on ECR discharge
performance," et al., 18th IEEE International Conference on Plasma
Science, Williamsburg, VA, June 3-5, 1991.
101. A.K.
Srivastava, M. Dahimene, T. Grotjohn, and J. Asmussen, "Operational
performance of a compact coaxial ECR plasma source for MBE applications,"
et al., 18th International Conference on Plasma Science,
102. G. King, T.
Grotjohn, and J. Asmussen, "Ion energy in a MPDR ECR source measured by
laser induced fluorescence," et al., 18th IEEE International Conference on
Plasma Science,
103. F.C. Sze, B.
Musson, D.K. Reinhard, and J. Asmussen, "Correlation of plasma properties
and etching performance in a 25-cm diameter microwave multi-cusp ECR plasma
reactor," 18th IEEE International Conference on Plasma Science,
Williamsburg, VA, June 3-5, 1991.
104. J. Asmussen,
"A review of ECR plasma processing technology," Invited Paper,
18th IEEE International Conference on Plasma Science,
105. A.K.
Srivastava, M. Dahimene, T. Grotjohn, and J. Asmussen, "Experimental
characterization of a compact ECR ion source," presented at the 4th
International Conference on Ion Sources, September 30-
106. G. King, D.
Sze, P. Mak, T.A. Grotjohn, and J. Asmussen, "Ion and neutral energies in
a multipolar ECR plasma source," presented at the 38th Annual AV's
Symposium and Topical Conference, November 1991.
107. P. Mak, G.
King, T. Grotjohn, and J. Asmussen, "Investigation of the influence of
electromagnetic excitation on ECR discharge properties," presented at the
38th Annual AV's Symposium and Topical Conference, November 1991.
108. J. Asmussen,
"Plasma and free radical sources for MBE processing," Invited
Paper presented at the III-IV Large Bandgap Workshop Sponsored by ONR,
109. J. Asmussen,
"Microwave applicator theory for single mode/multimode processing of
materials," Invited Paper presented at the Spring American Chemical
Society Meeting, San Francisco, California, April 5-10, 1992.
110.* E.B. Manring
and J. Asmussen, "Numerical calculations for single-mode, continuous
processing of rods and filaments," presented at the Spring American
Chemical Society Meeting, San Francisco, CA, April 5-10, 1992; also Polymeric
Materials Science and Engineering, 66, 476-477, 1992.
111. J. Asmussen,
"Microwave discharges as sources of ion beams and excited species for
plasma processing," Invited Paper presented at the NATO Advanced
Research Workshop on Microwave Discharges,
112. J. Asmussen,
"Applicator design principles for plasma processing and solid
material processing," Invited
Paper presented at the MRS Spring Meeting, Symposium L,
113. F.C. Sze and
J. Asmussen, "An investigation of the performance of ECR plasma sources
versus reactor size," presented at the 19th IEEE International Conference
on Plasma Science,
114. A.K.
Srivastava and J. Asmussen, "Performance measurements for a MBE-ECR plasma
and free radical source," presented at the 19th IEEE International
Conference on Plasma Science,
115. G.L. King,
P. Mak, T.A. Grotjohn, and J. Asmussen, "Experimental study of the
influence of plasma confinement conditions in ions in a multipolar ECR plasma
reactor," presented at the 19th IEEE International Conference on Plasma
Science,
116. P. Mak, W.
Tan and F.C. Sze, T.A. Grotjohn, and J. Asmussen, "Study of the electron
gas behavior in an ECR multipolar plasma source," presented at the 19th
IEEE International Conference on Plasma Science,
117. T.A.
Grotjohn and J. Asmussen, "Comparison of diamond deposition processing
techniques," Invited Paper presented at the ISHM Advanced
Technology Workshop: Diamond-like films,
118. J. Zhang, G.
King, T. Grotjohn, and J. Asmussen, "Diagnostic measurements of a resonant
cavity microwave plasma diamond deposition reactor," presented at the
Third International Conference on the New Diamond Science and Technology,
119. P. Mak, G.
King, J. Zhang, T. Grotjohn, and J. Asmussen, "Experimental diagnosis of
low pressure microwave discharges during diamond thin film deposition,"
presented at the Third International Conference on the New Diamond Science and
Technology,
120. B. Huang,
D.K. Reinhard, and J. Asmussen, "Electrical properties of undoped
large-grain and small-grain diamond films," presented at the Third
International Conference on the New Diamond Science and Technology,
121. A.K.
Srivastava and J. Asmussen, "Comparison of the operational performance of
a compact ECR plasma source at excitation frequencies of 2.45 GHz and 915
MHz," presented at the 39th National Symposium of the American Vacuum
Society,
122. F.C. Sze and
J. Asmussen, "Experimental scaling lows for ECR reactors," presented
at the 39th National Symposium of the American Vacuum Society,
123. F.C. Sze, G.
Alers, M. Ulczynski, D.K. Reinhard, B. Golding, and J. Asmussen, "Etching
of silicon with future sizes to 0.2 microns using a multipolar ECR plasma
reactor," presented at the 39th National Symposium of the American Vacuum
Society,
124. G.L. King,
P. Mak, T.A. Grotjohn, and J. Asmussen, "SF6-argon plasma
properties and behavior in a multipolar ECR plasma source," presented at
the 39th National Symposium of the American Vacuum Society,
125. J. Asmussen,
"Microwave processing of materials -- An electrical engineering
perspective," Invited Presentation presented to the National
Academy of Sciences Committee on Microwave Processing of Materials: An Emerging Industrial Technology, Washington
DC, August 12-13, 1992.
126. J. Asmussen
and J. Zhang, "Microwave plasma deposition of large area diamond thin
films," Invited Paper, Fourth Annual Diamond Technology Workshop,
University of Wisconsin, Madison, WI, March 24-26, 1993.
127. J. Zhang and
J. Asmussen, "Definition of microwave cavity plasma reactors for diamond
thin film deposition," Fourth Annual Diamond Technology Workshop, University of Wisconsin-Madison,
128. T. Theissen,
J. Zhang, T.A. Grotjohn and J. Asmussen, "Comparison of film thickness
measurement techniques," Fourth Annual Diamond Technology Workshop,
University of Wisconsin-Madison,
129. M.
Ulczynski, D.K. Reinhard, and J. Asmussen, "An investigation of low-pressure
diamond film deposition in a microwave plasma reactor," Fourth Annual
Diamond Technology Workshop, University of Wisconsin-Madison,
130.* E.B. Manring
and J. Asmussen, "Numerical model for the natural modes of a lossy,
cavity-loaded cylindrical cavity," 94th Annual Meeting of the American
Ceramic Society,
OH, April
18, 1993; also Ceramic Transactions, 26, "Microwaves: theory and
application in material processing II, Ed E. Clark, M.R. Tinga and J.R. Laia,
pp. 201-212, 1993.
131. M. Siegel,
M. Perrin, J. Asmussen, and E.B. Manring, "Development of a
precision-controlled automated microwave processing system," 94th Annual
Meeting of the American Ceramic Society, Cincinnati, OH, April 18, 1993.
132. J. Asmussen
and P. Mak, "Methods of and problems associated with process control of
microwave discharges," 20th IEEE International Conference on Plasma
Science,
133. A.K.
Srivastava, D. Sze, and J. Asmussen, "Discharge characteristics of a five
centimeter, multipolar ECR ion source," 5th International Conf. Ion
Sources, Beijing, China, August 31-September 4, 1993.
134. J. Asmussen
and P. Mak, "Control of ECR plasmas using internal cavity impedance
matching," 5th International Conf. Ion Sources, Beijing, China, August
31-September 4, 1993.
135. A.K.
Srivastava, J. Asmussen, T. Antaya and K. Harrison, "The study of a 2.45
GHz plasma source as a plasma generator for the SCECR," 5th International
Conf. Ion Sources, Beijing, China, August 31-September 4, 1993.
136. T.A.
Grotjohn, V. Gopinath, A.K. Srivastava and J. Asmussen, "Modeling and
characterization of hydrogen and helium discharges in a compact ECR ion/free
radical source," 5th International Conf. Ion Sources, Beijing, China,
August 31-September 4, 1993.
137. J. Asmussen,
"Diagnostic measurements, modeling and etching applications in the
multipolar ECR plasma reactor," Invited Paper, 15th Dry Process
Symposium,
138* J. Bansky, A.
Brockhaus, J. Engemann, J. Asmussen and S. Slosarcik, "3D - Green Tape
Planar Langmuir - sensor structures for plasma diagnostics," presented at
the ISAM meeting, Nov. 1993, also ISHM '93 proceedings, pp. 20-25, 1993.
139. J. Asmussen,
"Novel applications of ion plasma and radical beams for materials
synthesis," Invited Paper American Physical Society General
Meeting,
140. A.K.
Srivastava and J. Asmussen, "Experiments on the coupling mechanisms of a
compact ECR plasma source," presented at the IEEE International Conference
on Plasma Science,
141. A.K.
Srivastava and J. Asmussen, "Measurements of the impressed electric field
inside a coaxial ECR plasma source," presented at the IEEE International
Conference on Plasma Science,
142. P. Mak and
J. Asmussen, "An evaluation of an end excited electron cyclotron resonance
plasma source," presented at the IEEE International Conference on Plasma
Science,
143. J. Zhang and
J. Asmussen, "Characterization of a microwave cavity plasma reactor under
large area diamond film deposition conditions," presented at the IEEE
International Conference on Plasma Science,
144. M.
Ulczynski, D.K. Reinhard, M. Prystajko and J. Asmussen, "Microwave plasma
considerations for CVD of diamond films at low substrate temperatures,"
presented at the IEEE International Conference on Plasma Science,
145.* M. Ulczynski,
D.K. Reinhard, M. Prystajko and J. Asmussen, "Low temperature deposition
of thin film diamond," presented at the Fourth International Conference on
the New Diamond Science and Technology, Kobe Japan, July 17-22, 1994, also in
Proc. of 4th ICNDST, Kobe, Japan, 1994, Advances in New Diamond Science and
Technology, Edited by S. Saito et. al., pp. 41-44, 1994.
146. J. Zhang,
K.P. Kuo and J. Asmussen, "Microwave plasma assisted diamond film
deposition at moderate pressure," presented at the Fourth International
Conference on the New Diamond Science and Technology,
147. J. Asmussen,
"The evolution of microwave plasma diamond thin film deposition
reactors," Fifth Annual Diamond Technology Workshop,
148. J. Asmussen
and W. Richardson, "Experimental performance of compact microwave
electrothermal thruster," presented at the International Workshop on
Microwave Plasma and Its Applications,
149.* J. Asmussen,
"Microwave plasma processing for material synthesis," Planary
Lecture at the International Workshop on Microwave Plasma and Its
Application, Moscow, Russia, September 5-8, 1994, also appeared in Conference
Proceedings, Microwave Plasma and its Applications, edited by Y.A.
Lebedev, The Moscow Physical Society, pp. 52-83, 1995.
150.* K.Y. Lee,
E.D. Case, J. Asmussen and M. Siegel, "Sintering of alumina ceramics in
single mode cavities under automated control," presented at the 97th
Annual meeting of the American Ceramic Society, Cincinnati, OH, April 30 - May
3, 1995, also in Ceramic Transactions 59, "Microwave: theory and
application in material processing III,” Ed. E. Clark, M.R. Tinga pp. 473-480,
1995.
151. J. Asmussen,
J. Natarajan, M. Siegel and B. Wright, “Microwave cavity visualization and
diagnostic,” presented at the 97th Annual Meeting of the American Ceramic
Society,
152. S. Khatami
and J. Asmussen, "The experimental mapping of the independent input
variables into the output diamond thin film properties," presented at the
Sixth Annual Diamond Technology Workshop,
153. P. Mak and
J. Asmussen, "Experimental measurement of the impressed electric field in
a multipolar electron cyclotron resonance plasma source," presented at the
IEEE Conference on Plasma Science,
154. P. Mak and
J. Asmussen, "Experimental evaluation of the nonlinear relationships
between the input, internal and the output variables of a multipolar ECR plasma
source," presented at the 42nd Nat. Symposium of the American Vacuum
Society, Sept. 1995.
155. P. Mak, M-H.
Tsai, J. Natarajan, B.L. Wright and T.A. Grotjohn, "Investigation of
multipolar ECR plasma source sensors and models for process control,"
presented at the 42nd Nat. Symposium of the American Vacuum Society, Sept.
1995.
156.* K.Y. Lee,
E.D. Case, J. Asmussen and M. Siegel, “Microwave sintering of ceramic matrix
composites and the effect of organic binders in the sinter ability,” Ann Arbor,
Michigan 1995, also, in the conf. proceedings, Proceedings of the 11th Annual
ESD Advanced Composites Conference,
The Engineering Society, Ann Arbor, MI, pp. 491-503 (1995).
157. K.P. Kuo and
J. Asmussen, "An experimental investigation of high pressure synthesis of
diamond films using microwave plasma cavity reactors," presented at the
23rd IEEE Conference on Plasma Science,
158. S. Khatami
and J. Asmussen, "The experimental mapping of the independent input
variables into the output diamond thin film properties," presented at the
23rd IEEE Conference on Plasma Science,
159. M. Perrin
and J. Asmussen, "Evaluation of an end-feed, loop coupled, compact
microwave plasma source," presented at the 23rd IEEE Conference on Plasma
Science,
160. T. Grotjohn
and J. Asmussen, "Numerical simulations of resonant cavity microwave
systems for materials planning," presented at the 1996 Spring meeting of
the Materials Research Society, April 8-12, 1996,
161. J. Asmussen,
M. Siegel and B. Wright, "Microwave field visualization, diagnostics, and
processing applied to material loaded cavities," presented at the 1996
Spring meeting of the Materials Research Society, April 8-12, 1996,
162. G. Erten, A.
Gharbi, F.M. Salam, T. Grotjohn and J. Asmussen, “Using neural networks to
control the process of plasma etching and deposition,” presented at the
International Conference in Neural Networks,
163. K.P. Kuo and
J. Asmussen, "A parametric study of high pressure synthesis of diamond
films using a microwave plasma cavity reactor," presented at the Diamond
1996 Conference (7th European Conference on Diamond, Diamond-like and Related
Materials and the 5th International Conference on the New Diamond Science and
Technology).
164. M.
Ulczynski, D.K. Reinhard, and J. Asmussen, “Optical properties of diamond
coated borosilrent glass,” presented at Diamond 1996 Conference.
165. J. Asmussen
and P. Mak, “Micowave plasma processing discharge microwave equivalent circuits
and global plasma models,” Invited Planary Lecture presented at the
Third International Workshop on Strong Microwaves in Plasmas, Moscow/St.
Petersburg
166. P. Mak, T.A.
Grotjohn, and J. Asmussen, “Experimental investigation of collisional and
collisionless heating in low pressure microwave plasma discharge,” presented at
the 43rd National Symposium of the AVS,
167. K.Y. Lee,
E.D. Case and J. Asmussen, “Binder burn-out for ceramics and ceramic matrix
composites using a single-mode microwave cavity,” presented at American Ceramic
Society Meeting,
168. K.Y. Lee,
E.D. Case and J. Asmussen, “Dependence of heating characteristics on cavity
modes, geometry and volume of caskets in a single-mode microwave cavity,”
presented at the American Ceramic Society Meeting,
169. J. Asmussen
and P. Mak, “Microwave plasma processing discharges: microwave equivalent
circuits and global plasma models,” Invited Paper presented at the First
World Congress on Microwave Processing, Jan. 5-9, 1997, Florida.
170. K.Y. Lee,
E.D. Case and J. Asmussen, “Dependence of heating characteristics on cavity
modes, geometry and volume of gaskets in a single-mode microwave cavity,”
presented at the First World Congress on Microwave Processing, Jan. 5-9, 1997,
171. K.Y. Lee,
E.D. Case and J. Asmussen, “Microwave binder burn-out for batch processing of Al203, A1203/SiC
platelet and A1203/Zr03 particle
power compacts,” presented at the First World Congress on Microwave Processing,
Jan. 5-9, 1997,
172. S. Khatami
and J. Asmussen, “Controlled growth of microwave assisted plasma CVD of
diamond,” presented at the Third International Workshop on Microwave
Discharges: Fundamentals and Applications, Abbaye Royale de Fontevraud,
173. T. Ikegemi,
T. Grotjohn, D. Reinhard and J. Asmussen, “Boron doping to diamond and DLC
using plasma immersion ion implantation,” presented at the 29th IEEE
International Conference on Plasma Science, May 19-22, 1997,
174. M. Perrin
and J. Asmussen, “Evaluation of the resonant mode behavior of a compact, end
feed, microwave plasma source,” presented at the 29th IEEE International
Conference on Plasma Science, May 19-22, 1997,
175. V.M. Ayres, M. Farhan, W.S. Huang, J. Mossbrucker, B.
Wright and J. Asmussen, “Investigations of nitrogen incorporation in
heteroepitaxial diamond film growth,” presented at the APS Meeting, March
16-20, 1998,
176. M. Perrin, T. Grotjohn and J. Asmussen, “Evidence for
non-ECR collisonless heating in a low pressure microwave discharge,” presented
at the 25th IEEE International Conference on Plasma Science, June
1-4, 1998,
177. J. Mossbrucker, B. Wright and J. Asmussen, “3-D
determination of the location of non-diamond bound carbon, impurities and
stress components within a single crystal in a CVD diamond film using polarized
micro-raman spectroscopy,” presented at the 25th IEEE International
Conference on Plasma Science, June 1-4, 1998,
178. A. Halim Khan, M. Perrin and J. Asmussen, “Experimental
investigation of a small, compact, single mode, side feed microwave plasma
source,” presented at the 25th IEEE International Conference on
Plasma Science, June 1-4, 1998,
179. D. Story, T.A. Grotjohn, J. Asmussen, A. Vikharev and A.
Gorbachev, “Electron density measurements of moderate pressure
microwave-generated hydrogen discharges,” presented at the 25th IEEE
International Conference on Plasma Science, June 1-4, 1998,
180. W.S. Huang, K.P. Kuo, U. Kahler and J. Asmussen, “High
rate diamond deposition using a microwave discharge,” presented at the 25th
IEEE International Conference on Plasma Science, June 1-4, 1998,
181. J. Mossbrucker, W.S. Huang, B. Wright, V. Ayres., S.
Khatami and J. Asmussen, “Investigation of the effect of nitrogen incorporation
in hetroeptaxial diamond film growth, texture, morphology and crystalline
quality,” presented at the 25th IEEE International Conference on
Plasma Science, June 1-4, 1998,
182. V.M. Ayres, M. Farhan, J. Mossbrucker, W.S. Huang, B.
Wright and J. Asmussen, “Investigations of boundary layer formation as a
function of nitrogen concentration and reactor pressure during microwave plasma
deposition of diamond film,” presented at the 25th IEEE
International Conference on Plasma Science, June 1-4, 1998,
183. M. Siegel, J. Asmussen, M. Ali Uyanik and B. Wright,
“Measurement of the electromagnetic fields and modes of loaded microwave cavity
applicators near resonance and match,” presented at the 33rd
Microwave Power Symposium, July 11-15, 1998,
184. M. Perrin, A. Khan and J. Asmussen, “Investigation of
the Influence of the applicator on electromagnetic energy coupling into
microwave discharges,” presented at the 33rd Microwave Power
Symposium, July 11-15, 1998,
185. J. Asmussen, J. Mossbrucker, W.S. Huang, B. Wright, S.
Khatami and V. Ayres, “An investigation of the influence of nitrogen impurities
on the microwave plasma assisted growth of CVD diamond films,” presented at the
9th European Conference on diamond and diamond-like materials,
Nitrides and Silicon Carbide,
186. J. Mossbrucker and J. Asmussen, “3-D determination of
the location and absolute amount of sp2 and sp3 bound
carbon dopants, impurities, and stress components in CVD diamond films using
multi-color polarized Micro-Raman spectroscopy,” presented at the 9th
European Conference on diamond and diamond-like materials, Nitrides and Silicon
Carbide,
187. M. Perrin, T.A. Grotjohn and J. Asmussen, “Investigation
of unmagnetized plasma heating in low pressure microwave discharge,” 1999 NSF
Design and Manufacturing Grantes Conf. Long Beach, CA., Jan. 1999.
188. M. Perrin, T. Grotjohn and J. Asmussen, “Investigation
of unmagnetized plasma heating in a low pressure microwave discharge,”
presented at the 26th International ICOPS Conference on Plasma
Science, June 20-24, 1999 at
189. T.A. Grotjohn, J. Asmussen, J. Sivagnaname, D. Story,
A.L. Vikharev, A. Gorbachev, and A. Kolysko, “Electron density in moderate
pressure diamond deposition discharges,” presented at the 10th
European Conference on Diamond, Diamond-Like Materials, September
12-17,1999, Prague Czech Republic.
190. T.A. Grotjohn, D. Story, W.S. Huang, J. Sivagnaname and
J. Asmussen, “Plasma diagnostic measurements and numerical modeling of argon-
hydrogen-methene discharges used for nanocrystalline diamond deposition in a
microwave CVD system,” presented at the 10th European Conference on
Diamond, Diamond-Like Materials, September 12-17, 1999, Prague Czech Republic.
191. W.S. Huang and J. Asmussen, “The deposition of diamond
films using a hydrogen depleted microwave discharge,” presented at the 10th
European Conference on Diamond, Diamond-Like Materials, September 12-17, 1999,
Prague Czech Republic.
192. M. Farhan, V.M. Ayres, A. Khan, C. Adinata, M. Bataineh,
T. Grotjohn, B.L. Wright and J. Asmussen, “Development of FTIR emission
spectroscopy and controls for optimized diamond and diamond-like film
deposition,” presented at the 10th European Conference on Diamond,
Diamond-Like Materials, September 12-17, 1999, Prague Czech Republic.
193.
194. V.M. Ayres, T.R. Bieler, M.G. Kanatzidis,
195.
196. M. Perrin, T.A. Grotjohn and J. Asmussen, “Comparison of
magnetized and nonmagnetized low pressure discharges,” 2000 NSF Design and
Manufacturing Conference, Vancouver, Jan. 2000.
197.
198.
M. Perrin, T.A. Grotjohn and J. Asmussen, “The effect
of static magnetic field configuration on the ion production efficiency and
operational stability of a microwave plasma source,” presented at the 27th
International Conference on Plasma Science, June 4-7, 2000,
199. A. Khan and J. Asmussen, “Experimental characterization of a compact microwave plasma source employing three different coupling geometries,” to be presented at the 27th International Conference on Plasma Science, June 4-7, 2000, New Orleans.
200. W.S. Huang, J. Asmussen, B. Wright, A.R. Krauss, D.M. Gruen and A. Sumant, “The deposition of ultra-nanocrystalline diamond films using a Ar/H2/CH4 microwave discharge,” presented at the 27th International Conference on Plasma Science, June 4-7, 2000, New Orleans.
201.
W.S. Huang, T.A. Grotjohn and J. Asmussen, “Plasma
diagnostic measurements of argon-hydrogen-methane discharges used for
ultra-nanocrystalline diamond deposition in a microwave CVD systems,” presented
at the 27th IEEE International Conference on Plasma Science, June
4-7, 2000,
202. J. Asmussen, “Synthesis of nanocrystalline diamond,” Invited Presentation presented at the 2000 Gordon Conference on Diamond Synthesis, June 25-30, 2000 at Newport, RI.
203. W.S. Huang, Jes Asmussen, D.M. Gruen, S.L. Joan, A.R. Krauss and A. Sumant, “Microwave-plasma assisted chemical vapor deposition of nanocrystalline diamond films,” presented at the 2000 Gordon Conference on Diamond Synthesis, June 25-30, 2000 at Newport, RI.
204.
J. Asmussen, M. Perrin and T.A. Grotjohn, “A comparison
of magnetized and non-magnetized low pressure microwave discharges,” presented
at the IV International Workshop on Microwave Discharges: Fundamentals and
Applications,
205. V. Ayres, B. Wright, J. Asmussen, S. Song, S. Khatami, D. Reinhard, D. Tomanek, and D. Roach, “Characterization of the growth and emission properties of hybrid carbon films containing nanotubes,” Fullerenes 2000 Vol. 10: Chemistry and Physics of Fullerenes and Carbon Nanomaterials, Eds. P. V. Kamat, D. M. Guldi, K.M. Kadish, the Electrochemical Society, Inc., Pennington, NJ (2000), pp. 236-245.
206. J. K. Park, V. M. Ayres, J. Asmussen and K. Mukherjee, “Maskless patterning and structuring on ultra-hard film materials,” Mat. Res. Soc. Symp. Proc. Vol. 605: Materials Science of Microelectromechanical Systems (MEMS) Devices II, Eds. M.P. deBoer, A.H. Heuer, S.J. Jacobs, E. Peeters, The Materials Research Society, Warrendale, PA, (2000), pp. 79-84.
207. V. M. Ayres, T.R. Bieler, M.G. Kanatzidis, G. Stockman, B.L. Wright, and J. Asmussen, “Sequential effects of nitrogen on growth mechanisms of diamond thin films,” Diamond2000, September 3-7, 2000, Porto, Portugal, Abstract Book 5.3.12 (2000).
208. V. M. Ayres, T.R. Bieler, M. G. Kanatzidis, S. Song, R. Venia, A. Hoffman, M. Farhan, B. F. Wright, J. Spano, S. Hagopian, H. Balhareth, J. Abdul Majeed, D. Spach, B.L. Wright and J. Asmussen, “Increase and decrease of individual texture components in nitrogen/hydrogen/methane CVD polycrystalline diamond films,” Bull. Am. Phys. Soc., Vol. 45, No. 1, p. 540 (2000).
209.
D. Story, T. Grotjohn and J. Asmussen, “Experimental
investigation of mini-microwave plasma sources,” presented at the 28th
IEEE International Conference on Plasma Science, June 17-21, 2001,
210.
B. Bi, W.S. Huang, J. Asmussen and B. Golding, “Surface
acoustic waves on nanocrystalline diamond,” presented at the 12th
European Conference on diamond and diamond-like materials, carbon nanotubes,
nitrides and silicon carbide,
211. J. Asmussen, D. Story and T. Grotjohn, “Experimental and numerical model investigations of miniature microwave plasma sources,” presented at the 48th International Symposium of the American Vacuum Society, San Francisco, CA, Oct. 28-Nov. 2, 2001.
212.
T.A. Grotjohn and J. Asmussen, “Scaling of microwave
plasma sources to small dimensions,” presented at 2002 NSF Design, Service and
Manufacturing Granter and Research Conf.,
213.
B. Bi, W-S. Huang, J. Asmussen, M. Dykman, and B.
Golding, “Nucleation and growth of nanocrystalline diamond,” presented at the
13th European Conference on diamond and diamond-like materials,
carbon nanotubes, nitrides and silicon carbide,
214. A.L. Vikharev, A.M. Gorbachev, V.A. Koldonoi, R.A. Akhmadanov, D.B. Radishchev, T.A. Grotjohn, S. Zuo and J. Asmussen, “Comparison of pulsed and CW regions of MPACVD reactor operation,” presented at the 13th European Conference on diamond and diamond-like materials, carbon nanotubes, nitrides and silicon carbide, Spain, Fall 2002.
215.
T. Grotjohn, D. Story, S. Zuo,
216. S. Zuo, J. Narendra, A. Wijaya, D. Story, T.A. Grotjohn, and J. Asmussen, “Microwave power coupling principles for generating small microwave plasma,” presented at the 49th International Symposium of the American Vacuum Society, Denver, CO 2002.
217. M. Perrin, K. Hemawan, T. Grotjohn, and J. Asmussen, “A comparison of the performance between low pressure magnetized and non-magnetized microwave plasma,” presented at the 49th International Symposium of the American Vacuum Society, Denver, CO 2002.
218.
S. Zuo, T.A. Grotjohn, and J. Asmussen, “Unbounded and
bounded microwave plasma generated by a monopole antenna structure,” presented
at the 29th IEEE International Conference on Plasma
219.
A. Wijaya, S. Zuo, T.A. Grotjohn, and J. Asmussen,
“Miniature microwave plasma sources based on microstriphine designs,” presented
at the 29th IEEE International Conference on Plasma Science,
220.
T. Ikegami, M. Uchiyama, K. Ebihara, and J. Asmussen,
“Optical emission measurements of the graphite ablation plasma for carbon
nanotube formation by pulsed laser ablation,” presented at the
221.
T. Ikegami, M. Uchiyama, K. Ebihara, and J. Asmussen,
“LlF measurement of catalytric species in plasma plum for carbon nanotube
formities by PLA,” presented at the 49th Internatinal Symposium of
the American Vacuum Society, Denver, CO.,
222.
J. Asmussen, “An overview of research activities in the
micro and nano engineering center at
223.
T. A. Grotjohn, J. Asmussen, and J. Narendra, “
Microstripline Applicator for Generating Microwave Plasma Discharges,” 2003
Design, Service and Manufacturing grantees and research conference,
224.
T. A. Grotjohn, J. Asmussen, G. M. Swain, S. Zuo and A.
L. Vikharev, “Investigation of the scaling and control of microwave discharges
for diamond deposition on substrates of various sizes and shapes,” presented at
the Eighth International Symposium on Diamond Materials as part of The
Electrochemical Society Meeting,
225. J. Asmussen and T.A. Grotjohn, “Progress in microwave plasma-assisted diamond deposition,” presented at the 5th International Workshop on Microwave Discharges: Fundamentals and Applications Greifswald, Germany, July 8-12, 2003.
226.
T. A. Grotjohn, J. Narendra,
227.
T .A. Grotjohn, A. Moon, M. K. Yarn, T. Schuelke, D. K.
Reinhard and J. Asmussen, “Mechanical
properties of ultranano-, nano-, and poly-crystalline diamond films and
membranes,” presented at the 50th International AVS Symposium,
228.
T. A. Grotjohn, J. Narendra, and J. Asmussen, “Creation
and characteristics of miniature microwave plasmas,” presented at the 50th
International AVS Symposium,
229.
T. A. Grotjohn, K. Hemawan,
230.
D. K. Reinhard, M. Becker, R. A. Booth, T. A. Grotjohn,
and J. Asmussen, “Fabrication and properties of ultranano-, nano-, and
poly-crystalline diamond membranes and sheets,” presented at the 50th
International AVS Symposium,
231.
T.A. Grotjohn and J. Asmussen, “Scaling of microwave
plasmas to small dimensions,” presented
at the 2004 NSF Design, Service, and Manufacturing Grantees and Research
Conference,
232.
J. J. Narendra, T. A. Grotjohn, and J. Asmussen,
“Temperature and Density Measurements of Miniature Microwave Plasma Discharges,”
presented at the 31st IEEE International Conference on Plasma
Science,
233.
T. Schuelke, M. Becker, T.A. Grotjohn, and J. Asmussen, “The Vacuum Arc Plasma Source
and Its Applications,” presented at the 31st IEEE International
Conference on Plasma Science,
234.
S. Zuo, K. Hemawan, J. J. Narendra, T .A. Grotjohn, and
J. Asmussen, “Miniature Microwave Plasma Torch Applicator and its
Characteristics,” presented at the 31st International Conference on
Plasma Science,
235.
K. W. Hemawan, T. A. Grotjohn, and J. Asmussen,
“Atmospheric Microwave Discharges for Plasma Treatment of Fibers,” presented at
the 31st International Conference on Plasma Science,
236. T. A. Grotjohn, S. Zuo, K. Hemawan, J. J. Narendra, and J. Asmussen, “Design and Operating Characteristics of a Miniature Microwave Plasma Tourch,” Gordon Research Conference on Plasma Processing Science, New Hampshire, Aug. 2004.
237.
T. Grotjohn, R. Liske, J. Narendra, K. Hassouni, and J.
Asmussen, “Scaling Behavior of Microwave Reactor and Discharge Size for Diamond
Deposition,” presented at the 15th European Conference on Diamond,
Diamond –like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide,
238.
R. Liske, J. Fricke, M. Steinecke, J. Asmussen, T.
Grotjohn, D. Reinhard, and T. Schuelke, “Diamond CVD on Large Area Substrates
in a 915 MHz Microwave Reactor,” presented at the 15th European
Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and
Silicon Carbide,
239.
R. Liske, T. Wunderer, M. Leonhardt, T.A. Grotjohn, J. Asmussen
and T. Schuelke, “Extending the 3-Omegs method to the megahertz range for
thermal conductivity measurements of diamond thin films,” presented at the 8th
Applied Diamond Conference Nanocarbon 2005, Argonne Nat. Lab. Argonne, Ill.,
240.
D. Tran and J. Asmussen, “Synthesis of large-area,
thick, uniform smooth ultrananocrystalline diamond films by microwave
plasma-assisted chemical vapor deposition,” presented at the 8th
Applied Diamond Conference Nanodiamond 2005, Argonne Nat. Lab.,
241.
S. Zuo, T. A. Grotjohn, D. Reinhard, J. Asmussen, and
R. Ziervogel, “Deposition and post-processing of polycrystalline diamond for
freestanding films and substrates,” presented at the 8th Applied
Diamond Conference Nanodiamond 2005, Argonne Nat. Lab..,
242.
S. Zhou, L. Zong, N. Sgriccia, M. C. Hawley, S. Zuo and
J. Asmussen, “Synthesis of aligned carbon nanotubes by microwave plasma
chemical vapor deposition,” presented at the 8th Applied Diamond
Conference Nanodiamond 2005, Argonne Nat. Lab.,
243.
J. Narendra, D. Tran, H. Chen. J. Zhang, T.A. Grotjohn,
J. Asmussen and N. Xi, “Local area materials processing using a
microstripline-based miniature microwave discharge,” presented at the 2005 IEEE
International Conference on Plasma Science,
244.
K. W. Hemawan, S. Zuo, C. L. Romel, T. A. Grotjohn, I.
Wichman, E. Case and J. Asmussen, “Plasma-assisted combustion in a miniature
microwave plasma torch applicator,” presented at the 2005 IEEE International
Conference on Plasma Scvience,
245. S. Zuo, D.T. Tran,T.A. Grotjohn, D. Reinhard, J. Asmussen and R. Ziervogel, “Deposition and post-processing of polycrystalline and nanocrystalline diamond for freestanding films and substrates,” presented at the 16th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes and Nitrides, Toulouse, France, September 11-16, 2005.
246.
W.-S. Huang, D. T. Tran, J. Asmussen, T. A. Grotjohn,
and D. Reinhard, “Large area, thick ultrananocrystalline diamond films
synthesized by microwave plasma-assisted chemical vapor deposition,” presented
at the 16th European Conference on Diamond, Diamond-like Materials,
Carbon Nanotubes and Nitrides,
247. J. Asmussen, “Microwave plasma-assisted Diamond Synthesis: A brief review of the last twenty years and a vision of the future,” Invited paper, presented at the 2006 International Conference on Metallurgical Coatings and Thin Films, San Diego, CA., May, 1-5, 2006.
248.
*K.W. Hemawan, S. Zuo, C. L. Romel, I. S. Wichman, T.
A. Grotjohn, and J. Asmussen, “Microwave Plasma-assisted Premixed Flame
Combustion,” presented at the 3rd International Workshop on
Microplasmas,
249. J. Narendra, D. Tran, J. Zhang, T.Grotjohn, J. Asmussen and N. Xi, “Local area materials processing using a microstripline-based miniature microwave discharge,” presented at the 3rd International Workshop on Microplasmas, Greifwald, Germany, May 9-11, 2006.
250.
T. A. Grotjohn, D. T. Tran, and J. Asmussen, “Synthesis
and characterization of nanocrystalline diamond films including conducting
films,” Joint International Conference on New Diamond Science and Technology
and The Applied Diamond Conference,
251.
K. W. Hemawan, C. L. Romel, S. Zuo, I. S. Wichman, T.
A. Grotjohn, and J. Asmussen, “Microwave plasma-assisted premixed flame combustion,”
presented at the Central States Section Meeting of the Combustion Institute,
252. M.A. Perrin, T. A. Grotjohn,D. Reinhard, J. Asmussen, and J. Wander, “Evaluation of an end feed microwave cavity plasma source for diamond etching,” presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006.
253.
K. W. Hemawan, C. L. Romel, S. Zuo, T. A. Grotjohn,
I.S. Wichman, and J. Asmussen, “Plasma- assisted combustion in a miniature
microwave plasma torch applicator,” presented at the 2006 IEEE International
Conference on Plasma Science,
254.
J. Narendra, Y. Gu, J. Zhang, T.A. Grotjohn, N. Xi and
J.Asmussen, “Local area materials etching using microstripline-based miniature
microwave discharge,” presented at the 2006 IEEE International Conference on
Plasma Science, June 4-8,
255.
D. T. Tran, T. A. Grotjohn and J. Asmussen, “Synthesis
of ultrananocrystalline diamond films by a microwave plasma-assisted chemical
vapor deposition system,” presented at the 2006 IEEE International Conference
on Plasma Science, June 4-8,
256.
R. Ziervogel, M. K. Yaran, M. Becker, T. Schuelke and
J. Asmussen, “Deposition uniformity of ultrananocrystalline diamond on 6 and 8
inch diameter wafer substrates using a 915 MHz plasma assisted CVD Diamond
Reactor,” presented at the 2006 IEEE International Conference on Plasma
Science, June 4-8,
257.
S. Zuo, T. A. Grotjohn, D. Reinhard and J. Asmussen,
“Deposition and post-processing of polycrystalline diamond for freestanding
films and substrates,” presented at the 2006 IEEE International Conference on
Plasma Science, June 4-8,
258.
F. Marti, P. Miller, M. Becker, D. Tran, S. Zhou, J.
Asmussen, T.A. Grotjohn and D. Reinhard, “Diamond electron stripping foils for
high energy ion beams,” presented at the 2006 IEEE International Conference on
Plasma Science, June 4-8,
259. J. J. Narendra, D. Tran, J. Zhang, T. A. Grotjohn, J. Asmussen, N. Xi , “Miniature microwave plasma for localized etching,” NSF DMI Grantees Conference, St. Louis, July, 2006.
260. T. A. Grotjohn, J. Asmussen, S. Zuo, J. J. Narendra, “Scaling of microwave plasma sources to small dimensions,” NSF DMI Grantees Conference, St. Louis, July, 2006.
261.
J. J. Narendra, D. Tran, J. Zhang, T. A. Grotjohn, J.
Asmussen, and N. Xi, “Miniature microwave plasma for localized etching,” Gordon
Research Conference on Plasma Processing Science,
262. K. Hemawan, C. Romel, S. Zuo, I. Wichman, T. A. Grotjohn, and J. Asmussen, “Plasma-assisted combustion in a miniature microwave plasma torch application,” Gordon Research Conference on Plasma Processing Science, Massachusetts, Aug. 2006.
263.
T.A. Grotjohn, J. Narendra, J. Zhang, J. Asmussen and
N. Xi, “Miniature microwave plasma discharge for local area materials
processing,” presented at the VI International Workshop on Microwave
Discharges: Fundamentals and Applications, September 11-15,
264. S. Zuo, M. K. Yaran, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, “Investigation of diamond deposition uniformity and quality for freestanding film and substrate applications,” presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006.
265.
R. Ziervogel, M. F. Becker, T. Schuelke, J. Asmussen,
T.A. Grotjohn and D. K. Reinhard, “Deposition uniformity of
ultrananocrystalline diamond on 150 and 200 mm wafer substrates,” presented at
the 17th European Conference on Diamond, Diamond-like Materials,
Carbon Nanotubes, and Nitrides, September 3-8,
C. Other Invited Presentations and Talks
Dr. J. Asmussen has given over sixty other invited talks and presentations on wind power, plasma, and microwave technologies at regional conferences, university and industry seminars, professional groups, and radio and TV talk shows. Included in these are over thirty-five seminar presentations at (1) Univ. of Paris [3]; (2) Univ. of Wuppertal; Germany [4]; (3) Univ. of Michigan [4]; (4) Univ. of Iowa; (5) Univ. of Wisconsin-Madison; (6) Univ. of Connecticut; (7) IBM T.J. Watson Res. Ctr. [3]; (8) SEMATECH; (9) Gen. Motors Tech Center (10) W. Michigan Univ., (11) Nat. Chiao Tung Univ. Taiwan [6 hr. plus an additional lecture in 2004 ], (12) University of Arkansas, (13) Sumitomo Metal Industries, Amagasaki, Japan, (14) Institute of Applied Physics (Russian Academy of Sciences), Nizhny, Novgorod, Russia, (15) The Dow Chemical Co., (16) Lambda Technologies, (17) Yufu in, Japan, (18) Kumamoto University, Japan [3], (19) National Taiwan University, (20) Industrial Technology Research Institute, Materials Research Laboratory, Taiwan, (21) National Synchrotron Radiation Research Center, Taiwan, (22) National Central University, Taiwan and (23)Exxon/Mobile
D. Patents (this list includes 43 patents; 22 U.S. Patents, 8 Canadian Patents, 7 Japanese Patents, 6 EPC Patents)
1. J.
Asmussen and J. Root, "Ion generating apparatus and method for the use thereof,"
U.S. Patent No. 4,507,588,
2. J.
Asmussen, S. Nakanishi, J. Malinkey of NASA-Lewis, and
3. J. Asmussen and D.K. Reinhard, "Method for treating a surface with a microwave or UHF plasma and improved apparatus," U.S. Patent
No.
4,585,688,
4. J.
Asmussen and D.K. Reinhard, "Microwave or UHF plasma improved
apparatus," U.S. Patent No. 4,630,566,
5. T. Roppel, D.K. Reinhard, and J. Asmussen, "Dual plasma microwave apparatus and method for treating a surface,” U.S. Patent
No. 4,691,662, September 8, 1987 also Canadian Letters Patent No. 1,311,214, March 29, 1994; also EPC Patent No. 270667.
6. J. Asmussen, D.K. Reinhard, and M. Dahimene, "Plasma generating apparatus using magnets and method," U.S. Patent No. 4,727,293, February 23, 1988.
7. J. Asmussen, "Method for treating a material using radio frequency waves," U.S. Patent No. 4,777,336, October 11, 1988; also Canadian Patent No. 1,296,393, February 1992
8. J. Asmussen, "Microwave apparatus," U.S. Patent No. 4,792,772, December 20, 1988; also Canadian Letters Patent No. 1,287,666, August 13, 1990; EPC Patent No. 0328618; Japan No 1,971,687.
9 J. Asmussen and D.K. Reinhard, "Improved plasma reactor apparatus and method for treating a substrate," U.S. Patent No. 4,943,345, July 24, 1990, also Canadian Letters Patent No. 2,008,926; EPC 90,10439387, Japanese Patent No. 2,553,947.
10. J. Asmussen, "Improved coaxial cavity type, radiofrequency wave, plasma generating apparatus," U.S. Patent No. 4,906,900, March 6, 1990; also Canadian Patent No. 2,010,245; EPC 90,1044502; Japanese Patent No. 1,873,330.
11. J. Asmussen and J. Hopwood, "Improved resonant radiofrequency wave coupler apparatus using higher modes," U.S. Patent No. 5,081, 398, January 14, 1992, also EPC No 91,900585, Japanese Patent No. 2,822,103.
12. J. Asmussen and R. Fritz, "Radiofrequency wave treatment of a material using a selected sequence of modes,” U.S. Patent No. 5,008,506, April 16, 1991, also Japanese Patent No. 2,083,066; EPC 90, 9165722.
13. J. Asmussen and J. Zhang, "Apparatus for the coating of a material on a surface using a microwave or UHF plasma," U.S. Patent No. 5,311,103, May 10, 1994.
14.
J. Zhang and J. Asmussen, "Method and apparatus
for plasma treatment of a surface,” U.S. Patent No. 5,645,645,
15.
J. Zhang and J. Asmussen, “Method and apparatus for
plasma treatment of a surface,” U.S. Patent No. 5,571,577,
16. R. Fritz, L. Drzal and J. Asmussen, "Microwave curing device for composite repair of adhesives," MSU 1.7-187.
17.
M. Ulczynski, D.K. Reinhard and J. Asmussen,
"Process for depositing adherent diamond thin films,” U.S. Patent No.
5,897,924,
18.
M. Ulczynski, D.K. Reinhard and J. Asmussen,
"Resonant radiofrequency wave plasma generating apparatus with improved
stage,” U.S. Patent No. 5,736,818,
19.
D.K. Reinhard, R. Chakraborty and J. Asmussen,
"Method for radiofrequency wave etching,” U.S. Patent No. 6,077,787,
20. M.C.
Hawley, J. Asmussen, J. Wei and T. Shidaker, “Method for liquid thermosetting
resin molding using radiofrequency wave heating," U.S. Patent No.
5,770,143,
21. M.C. Hawley, J. Asmussen, J. Wei and T. Shidaker, “Apparatus for liquid thermosetting resin molding using radiofrequency wave heating,” U.S. Patent No. 5,844,217, Dec. 1, 1998.
22. K.P. Kuo and J. Asmussen, "A method for uniform diamond coating on the high packaging density drill tools using a CO/H2 microwave plasma jet discharge," disclosed to MSU May 18, 1996.
23. K.P. Kuo, J. Asmussen, T. Chaudhry and L. Drzal, “Method and apparatus for uniform diamond thin coating on carbon fibers using a CO/CH4/H2 microwave plasma jet discharge,” disclosed to MSU, August 1997.
24. J. Asmussen, M. Siegel, A. Uyanik and B. Wright, “Method and apparatus to excite rotating electromagnetic fields inside a signal mode microwave applicator,” disclosed to MSU, July 1998.
25. J. Asmussen and W.S. Huang, “Process for synthesizing uniform nanocrystalline films,” U.S. Patent application by MSU, MSU 4.1-572, ID01-060, Oct. 3, 2001.
26. J. Asmussen, “Method and apparatus for rapidly and uniformity heating conducting and semiconducting materials with microwave energy,” disclosed to MSU Sept. 2001.
27.
T. Grotjohn, J. Asmussen and A. Wijaya, “Microwave
Stripline Applicators,”
28. B. Bi, B. Golding, W.S. Huang, and J. Asmussen, “Surface acoustic wave devices based on unpolished nanocrystaline diamond,” US Patent No. 6,858,969, February 22, 2005.
29. D. K. Reinhard, J. Asmussen, M. F. Becker, T. A. Grotjohn, T. Schuelke, and R. Booth, “Drapable diamond thin films and method for the preparation thereof,” U.S. Patent No. 7,147,810, Dec. 12, 2006.
30. J. Asmussen, M. C. Hawley, S. Zhou, and S. Zuo, “Synthesis of long and Well-aligned Carbon Nanotubes,” MSU 4.1-752; ID04-69, submitted to the U.S. Patent Office June 2006.
31. J. Asmussen, T. A. Grotjohn, S. Zuo and K. Hemawan, “Miniature microwave plasma torch application and method of use thereof,” disclosed to MSU in Nov. 2003; a provisional patent application was filed at the Patent and Trademark Office on April 7, 2004; MSU 4.1-681.
32. T.A. Grotjohn, N. Xi, and J.Asmussen, Micro and nanoscale ion, free radical and UV light sources,” invention disclosure submitted to the MSU IP office in Sept. 2004, MSU 4.1-740.
33.
J. Asmussen, T. Grotjohn, and N Xi, “Process and
Apparatus for Modifying a Surface in a work region,” MSU 4.1-740; ID 04-038;
34.
J. Asmussen, “A high pressure microwave plasma CVD
reactor,” disclosed to the MSU Intellectual Propriety Office on
E. Books and/or Book Chapters
1. B.A. Stout, "Energy use and management in agriculture," Copyright 1984 Breton Publishers, MA (Asmussen contributed sections on alternative energy, pp. 155‑166).
2. J. Asmussen, "Ion and electrothermal microwave thrusters for spacecraft propulsion," McGraw-Hill Yearbook of Science and Technology, Copyright 1984, McGraw-Hill Book Co., pp. 338‑341.
3. S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, "Handbook of Plasma Processing Technology, 1990 Noyes Pub., NJ, (J. Asmussen contributed Chapter 11, entitled "Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition, pp. 285-307).
4. J. Asmussen, "Plasma processing," McGraw-Hill Yearbook of Science and Technology, Copyright 1992, McGraw-Hill Book Co.,
pp. 353-356.
5. O. Popov, High Density Plasma Sources, 1996 Noyes Pub., NJ, (J. Asmussen contributed Chapter 6 entitled, "Microwave Plasma Disk Reactor Processing Machines", pp. 251-308).
6. J. Asmussen and D. Reinhard, editors of Diamond Film Handbook, Marcel Dekker in 2002. J. Asmussen also contributed Chapter 7 with T. Grotjohn entitled, ‘Microwave Plasma-Assisted Diamond Film Deposition,” pp. 211- 302.
F. Technical Reports and Publications
1. J. Asmussen and M.C. Hawley, "A study of synthetic natural gas from plasma catalyzed chemical reactions," Final Report to Detroit-Edison Company.
2. J. Asmussen and M.C. Hawley, "Microwave processing of Kraft process black liquor," Final Report to Kimberly-Clark Corp.
3.
J. Asmussen, O. Krauss, D.E. Linvill, and
4.
R. Zapp, J. Asmussen, and D.K. Reinhard, "Highway
department demonstration of solar and wind energy," Division of
Engineering Research Report to Michigan Department of State Highways and
Transportation,
5. J. Asmussen, R.E. Wong, J. Clark, W.L. Haworth, J.M. Mattila, R. Nabozny, and H.S. Flaishe, "Solar manufacturing technology assessment," X1‑9‑8001‑1, X1‑9‑8021‑1 Central Solar Energy Research Corp., Detroit, MI, June 1979.
6. W. Rose, J. Asmussen, and W. Stout, "Commercially available wind machines," MSU Agricultural Engineering Information Series, AEIS H426, May 1980.
7. W. Rose, J. Asmussen, and W. Stout, "AG Economic Analysis," MSU Agricultural Engineering Information Series AEIS #427, April 1980.
8. W. Rose, J. Asmussen, and W. Stout, "Wind energy economic analysis with a programmable calculator," MSU Agricultural Engineering Information Series, AEIS #C41, September 1980.
9. W. Rose, J. Asmussen, and W. Stout, "Wind resources in Michigan," MSU Agricultural Engineering Information Series, AEIS #437, August, 1980, also
10.
part of Energy Extension Service. Energy Dispatch
Bulletin, Energy Administration,
11.
J. Asmussen and the CSERC Staff, "Producibility of
the 15 kW WTG,"
G. Major
Professor for Ph.D and M.S. Thesis
Ph. D Thesis Dissertations
1. Quong Hon Lee, Ph.D Thesis MSU 1970, “An experimental study of nonlinear phenomena in a resonantly sustained microwave plasma.”
2. Robert Michael Fredericks, Ph.D. Thesis MSU 1971, “An experimental and theoretical study of resonantly sustained plasma in microwave cavities.”
3. Raghuveer Mallavarpu, Ph.D. Thesis MSU 1976, “An investigation of the electromagnetic behavior of a microwave plasma source over a wide range of pressures and flow rates.”
4. James Rustin Rogers, Ph.D. Thesis MSU 1982, “Properties of steady-state, high pressure argon microwave discharges.”
5.
6. Lydell Lemoine Frasch, Ph.D. Thesis MSU 1987, “An experimental and theoretical study of a microwave cavity applicator loaded with lossy materials.”
7. Mahmoud Dahimene, Ph.D. Thesis MSU 1987, “Development of a microwave ion and plasma source immersed in a multicusp electron cyclotron resonant magnetic field.”
8. Haw-Haw Lin, Ph.D Thesis MSU 1989, “Theoretical formulation and experimental investigation of a cylindrical cavity loaded with lossy dielectric material.”
9. Jeffrey Alan Hopwood, Ph.D. Thesis MSU 1990, “Macroscopic properties of a multipolar electron cyclotron resonance microwave-cavity plasma source for anisotropic silicon etching.”
10. Edward Benjamin Manring, Ph.D. Thesis MSU 1992, “Electromagnetic field solutions for the natural modes of a cylindrical cavity loaded with lossy materials.”
11. Jie Zheng, Ph.D. Thesis MSU 1993, “Experimental development of microwave cavity plasma reactors for large area and high rate diamond film deposition.”
12. Fan Cheng Sze, Ph.D. Thesis MSU 1993, “Design and experimental investigation of a large diameter electron cyclotron resonant plasma source.”
13. Aseem Kumar Sirvastava, Ph.D. Thesis MSU 1995, “Properties of electron cyclotron resonance plasma sources”.
14. Kuo-Ping Kuo, Ph.D. Thesis MSU 1997, “Microwave assisted plasma CVD of Diamond film using thermal-like plasma discharges.”
15. Said Khatami, Ph.D. Thesis MSU 1997, “Controlled Synthesis of diamond films using a microwave discharge (non equilibrium plasma).”
16. Peng Un Mak, Ph.D. Thesis MSU 1997, “An experimental evaluation of a 12.5-cm diameter multipolar microwave electron cyclotron resonance plasma source.”
17. Mark Alan Perrin, Ph.D. Thesis MSU 2002, “Investigation of a 17.8cm diameter end feed microwave cavity plasma source with and without a static magnetic field.”
18. Wen-Shin Huang, Ph.D. Thesis MSU 2004, “Microwave Plasma-assisted chemical vapor deposition of ultra-nanocrystalline diamond films.”
M.S.
Thesis Dissertations
1. Ronald Edward Fritz, M.S. Thesis MSU 1979, “An experimental investigation of the characteristics of rf surface wave generated plasmas.”
2. William Thomas Rose, M.S. Thesis MSU 1981, “Feasibility analysis of small wind energy conversion systems,” With R. A. Stout.
3. Edward Benjamin Manring, M.S. Thesis MSU 1988, “An experimental investigation of the microwave heating of solid non-reactive materials in a circular cylindrical resonant cavity.”
4. Leonard
Joseph Mahoney, M. S. Thesis MSU 1989, “The design and testing of a compact
electron cyclotron resonant microwave-cavity ion source.”
5. Uwe Kahler, Diplomarbeit Bergische Universitat Gesamthochschule Wuppertal and Michigan State University, Aug. 1997, Mikrowellenplasma-induzierte Abscheidung Polykristalliner Diamantfilme (Microwave plasma diamond film growth).
6. Amir Halim Khan, M. S. Thesis MSU 1999, “Experimental characterization of a compact MPDR plasma source employing three different coupling geometries.”
7. Kadek Wardika Hemawan, M.S. Thesis MSU 2003, “Numerical and experimental measurements of material loadings in cylindrical microwave cavity applicators.”