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Al-Ahsan Talukder

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Al-Ahsan Talukder

Al-Ahsan Talukder is currently a research assistant in Plasma Sources and Processing Lab/ Fraunhofer USA CCD (Center for Coatings and Diamond Technologies). He has been a Ph.D. student in ECE department of Michigan State University (MSU) since August 2017. He obtained his MS in Electrical Engineering degree from South Dakota State University in August 2016. He received his B.Sc. in Electrical and Electronic Engineering degree from Khulna University of Engineering & Technology (KUET), Bangladesh in 2010. He is a Graduate Leadership Fellow in College of Engineering at MSU for the academic year 2019-20. He was also awarded Michigan Institute of Plasma Science and Engineering (MIPSE) fellowship for the academic year 2017-18. 


Al-Ahsan’s current research interest includes thin films, physical vapor deposition, plasma processing, electronic materials, thin-film sensors, and electronic devices.