Fraunhofer USA CCD offers access to the joint Fraunhofer/University laboratories, which are located on the campus of Michigan State University (East Lansing, Michigan) and an industrial laboratory in Plymouth, Michigan. Facilities related to the pre-treatment, synthesis/evaporation, processing and characterization of diamond materials and thin films include:
Chemical Vapor Deposition Equipment
- 3x 2.45 GHz microwave plasma assisted chemical vapor deposition machines for diamond synthesis (intrinsic)
- 1x 2.45 GHz microwave plasma assisted chemical vapor deposition machine for boron-doped (p-type) diamond synthesis
- 1x 2.45 GHz microwave plasma assisted chemical vapor deposition machine for phosphors-doped (n-type) diamond synthesis
- 1x 915 MHz microwave plasma assisted chemical vapor deposition machine for diamond synthesis
Physical Vapor Deposition Equipment
- 3x fully automated industrial coating machines
- 1x R&D physical vapor deposition system
- DC cathodic vacuum arc sources
- RF/DC magnetron sputter sources
- Anode layer ion source
- Laser-Arc System for deposition of tetrahedrally bonded amorphous carbon (ta-C)
Post-Processing and Micro Fabrication Equipment
- Diamond lapping and polishing machine
- Laser for micro machining
- Cleanroom including PE-CVD, DC/RF sputtering. e-beam evaporation, photo lithography, diffusion furnaces, and plasma etching
- Electron cyclotron resonance plasma etcher
Characterization
- Laser induced surface acoustic wave tester to measure Young’s modulus (More Info)
- Optical and electron microscopes (SEM) including energy dispersive X-ray spectroscopy for chemical analysis (EDX)
- Wear testing (wear volume and coefficient of friction) dry and lubricated
- Cyclic voltammetry electrochemical tester
- Contact angle measurement
- Calo-Tester
- Surface profilometry
- Raman spectroscopy
- X-ray diffraction (XRD)
- Photo electron spectroscopy (XPS)
- FTIR spectroscopy
- UV-Vis spectroscopy
- Atomic force microscopy (AFM)