Department of Electrical and Computer Engineering Michigan State University 2120 Engineering Bld. East Lansing, MI 48824 (517) 353-8906 grotjohn@egr.msu.edu
Education Ph.D.; Electrical Engineering; Purdue University; 1986; Major Advisor: B. Hoefflinger; Thesis Topic: Investigation of Unified Table and Analytical Device Models for Accurate Circuit Simulation M.S.; Electrical Engineering; University of Minnesota; 1984 B.E.E.; Electrical Engineering; University of Minnesota; 1982
Professional Experience 2005-present Acting Chairperson, Electrical and Computer Eng., MSU 2000-present Professor, Electrical Engineering, Michigan State University 1993-2000 Associate Professor, Electrical Engineering, Michigan State University 1999 (1.5 months) Visiting Professor, University of Paris-Nord, France 1997 (1 month) Visiting Professor, University of Paris-Nord, France 1996 (2 months) Visiting Professor, University of Paris-Nord, France 1987-1993 Assistant Professor, Electrical Engineering, Michigan State University 1986(Nov-Dec) Visiting Researcher, Inst. of Microelectronics, Stuttgart, West Germany 1985-1986 Graduate Instructor, Purdue University 1985,1983 Member Technical Staff (summer), AT&T Bell Laboratories 1982-1983 Teaching Assistant, University of Minnesota
Scholarly Interests
Dr. Grotjohn's scholarly interests include the modeling, design, diagnostics, and control of plasma-assisted materials processes and processing machines. This work focuses on the use of models, including electromagnetic, plasma dynamic, and plasma chemistry models, for the design and control of microwave plasma reactors used for materials processing. Specific processes studied have included diamond CVD deposition, amorphous carbon deposition, semiconductor etching, and general microwave-generated plasma discharges operated as ion and radical sources. In coordination with the modeling studies are plasma diagnostic studies including a variety of techniques including optical emission spectroscopy, laser spectroscopy, Langmuir probes, and millimeter wave resonator diagnostics. Recent work is especially looking at mini- and micro-scale plasma discharges and their application.
Awards
Graduate School Fellowship, University of Minnesota, 9/83-6/84.
American Electronics Association−Hewlett Packard Faculty Development Fellowship, Purdue University, 1/84-12/86.
Withrow Excellence in Teaching Award, Electrical and Computer Eng., College of Engineering, Michigan State University, 2002.
Withrow Distinguished Scholar Award, College of Engineering, Michigan State University, 2004.
Withrow Exception Service Award, College of Engineering, Michigan State University, 2005.
Memberships IEEE (Senior Member), ASEE, Eta Kappa Nu, Sigma Xi, Phi Kappa Phi, Materials Research Society and American Vacuum Society.
Journal Publications
1) T. A. Grotjohn and B. Hoefflinger, "A Parametric Short-channel MOS Transistor Model for Subthreshold and Strong Inversion Current," joint issues of IEEE Trans. on Electron Devices, vol. ED-31, pp. 234-246, 1984 and IEEE J. of Solid-State Circuits, vol. SC-19, pp. 100-112, 1984.
2) T. A. Grotjohn and B. Hoefflinger, "Sample-Set Differential Logic for Complex High Speed VLSI," IEEE J. of Solid-State Circuits, vol. SC-21, pp. 367-369, 1986.
3) T. A. Grotjohn, "Compensation Effects on the Electron Velocity in Submicron GaAs MES-FET's," IEEE Tran. on Electron Devices, vol. 35, pp. 1144-1145, 1988.
4) Y.-T. Tsai and T. A. Grotjohn, "Source and Drain Resistance Studies of Short-Channel MES-FET's Using Two-Dimensional Device Simulators, IEEE Trans. on Electron Devices, vol. 37, pp. 775-780, 1990.
5) Y.-T. Tsai and T. A. Grotjohn, "Small-Signal Analysis of MESFET's Including the Energy Conservation Equation," IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, vol. 10, pp. 1530-1533, 1991.
6) T. A. Grotjohn, "Numerical Modeling of a Compact ECR Ion Source," Review of Scientific Instruments, vol. 63, pp. 2535-2537, 1992.
7) A. K. Srivastava, M. Dahimene, T. Grotjohn, and J. Asmussen, "Experimental Characterization of a Compact ECR Ion Source," Review of Scientific Instruments, vol. 63, pp. 1556-2558, 1992.
8) G. King, F. C. Sze, P. Mak, T. A. Grotjohn, and J. Asmussen, "Ion and Neutral Energies in a Multipolar Electron Cyclotron Resonance Plasma Source," J. Vac. Sci. Technol. A, vol. 10, pp. 1265-1269, 1992.
9) P. Mak, G. King, T. A. Grotjohn, and J. Asmussen, "Investigation of the Influence of Electro-magnetic Excitation on Electron Cyclotron Resonance Discharge Properties," J. Vac. Sci. Technol. A., vol. 10, pp. 1281-1287, 1992.
10) C. J. Sun, D. K. Reinhard, T. A. Grotjohn, C. J. Huang, and C. C. W. Yu, "Hot-Electron- Induced Degradation and Post-stress Recovery of Bipolar Transistor Gain and Noise Characteris-tics, IEEE Trans. on Electron Devices, vol. 39, pp. 2178-2180, 1992.
11) C.-J. Huang, T. A. Grotjohn, C. J. Sun, D. K. Reinhard, and C. C. W. Yu, "Temperature Dependence of Hot Electron Degradation in Bipolar Transistors, IEEE Trans. on Electron Devices, vol. 40, pp. 1669-1674, 1993.
12) V. Gopinath, G. T. Salbert, T. A. Grotjohn, and D. K. Reinhard, "ECR Sputter Removal of Silicon Dioxide on Silicon Wafers," J. of Vacuum Science and Technol., vol. B11, pp. 2067-2070, 1993.
13) T. A. Grotjohn, "Ion Sources for Microfabrication," Rev. Scientific Instruments, vol. 65, pp. 1298-1303, 1994.
14) T. A. Grotjohn, W. Tan, V. Gopinath, A. K. Srivastava, and J. Asmussen, "Modeling the Electromagnetic Excitation of a Compact ECR Ion/Free Radical Source," Rev. Scientific Instruments, vol. 65, pp. 1761-1765, 1994.
15) C. J. Sun, T. A. Grotjohn, C. J. Huang, D. K. Reinhard, and C.-C. W. Yu, "Forward-Bias Stress Effects on BJT Gain and Noise Characteristics," IEEE Trans. on Electron Devices, vol. 41, pp. 787-792, 1994.
16) W. Tan and T. A. Grotjohn, "Modeling the Electromagnetic Excitation of a Microwave Cavity Plasma Reactor," J. of Vacuum Sci. and Technol., vol. A-12, pp. 1216-1220, 1994.
17) V. P. Gopinath and T. A. Grotjohn, "Three-Dimensional Electromagnetic PIC Model of a Compact ECR Plasma Source," IEEE Trans. on Plasma Science, vol. 23, pp. 602-608, 1995.
18) W. Tan and T. A. Grotjohn, "Modeling the Electromagnetic Field and Plasma Discharge in a Microwave Plasma Diamond Deposition Reactor," Diamond and Related Materials, vol. 4, pp. 1145-1154, 1995.
19) T. A. Grotjohn, G. L. King, and W. Tan, "Microwave Plasma Processing Machine Modeling and Diagnostics for Plasma Assisted Chemical Vapor Deposition," J. Moscow Physical Society, 5, 55, 1995.
20) T. A. Grotjohn, "Modeling the Electron Heating in a Compact ECR Ion Source," Review of Scientific Instruments, vol. 67, pp. 921-923, 1996.
21) P. Mak, M.-H. Tsai, J. Natarajan, B. L. Wright, T. A. Grotjohn, F. M. A. Salam, M. Siegel, and J. Asmussen, "Investigation of Multipolar Electron Cyclotron Resonance Plasma Source Sensors and Models for Plasma Control," J. of Vacuum Sci. and Technol., vol. A-14, pp. 1894-1900, 1996.
22) J. Mossbrucker and T. A. Grotjohn, "Determination of Local Crystal Orientation of Diamond using Polarized Raman Spectra," Diamond and Related Materials, vol. 5, pp. 1333-1343, 1996.
23) F. M. Salam, C. Piwek, G. Erten, T. Grotjohn, and J. Asmussen, "Modeling of a Plasma Pro-cessing Machine for Semiconductor Wafer Etching Using Energy-functions-based Neural Net-works, IEEE Trans. on Control Systems Technology, 5, no. 6 , pp. 598-613, 1997.
24) J. Mossbrucker and T. A. Grotjohn, "Determination of the Direction of Stress in a Polycrys-talline Diamond Film Using Polarized Raman Spectroscopy," J. of Vacuum Sci. and Technol., A, 15, pp. 1206-1210, 1997.
25) J. Asmussen, T. A. Grotjohn, P. U. Mak, and M. A. Perrin, "The Design and Application of Electron Cyclotron Resonance Discharges," IEEE Trans. on Plasma Science, vol 25, pp. 1196-1221, Dec. 1997.
26) T. A. Grotjohn, "Modeling Electromagnetic Fields for the Excitation of Microwave Dis-charges used for Materials Processing," J. Phys. IV France, vol. 8, pp. 61-79, 1998.
27) K. Hassouni, T. A. Grotjohn and A. Gicquel, "Self-consistent Microwave Field and Plasma Discharge Simulations for a Moderate Pressure Hydrogen Discharge Reactor," J. Appl. Phys., vol. 86, pp. 134-151, 1999.
28) B. K. Kim and T. A. Grotjohn, "Comparison of a-C:H Films Deposited from Methane/Argon and Acetylene/Argon ECR-CVD Discharges," Diamond and Related Materials, vol. 9, pp. 37-47, 2000.
29) T. A. Grotjohn, J. Asmussen, J. Sivagnaname, D. Story, A. L. Vikharev, A. Gorbachev, and
A. Kolysko, "Millimeter Wave Fabry-Perot Resonator Plasma Diagnostic Measurements of Electron Density in Moderate Pressure Diamond Deposition Discharges," Diamond and Related Materials, vol. 9, pp. 322-327, 2000.
30) B. K. Kim and T. A. Grotjohn, "Hydrogenated Amorphous Carbon Films Deposited in an ECR-CVD Discharge Reactor using Acetylene," Diamond and Related Materials, vol. 9, pp. 654-657, 2000.
31) K. Hassouni, T. A. Grotjohn, A. Gicquel, “Different discharge regimes in a microwave cavity coupling system used for the generation of moderate pressure H2 and H2/CH4 plasmas,” IEEE Tran. Plasma Sci., 30, 172-173, 2002
32) Rummel P, Grotjohn TA, “Methods for modeling microwave plasma system stability,”
J. Vac. Sci. Technol., A 20, 536-543, 2002
33) A.L. Vikharev, A.M. Gorbachev, V.A. Koldanov, R.A. Akhmedzhanov, D.B. Radishchev,
T.A. Grotjohn, S. Zuo, and J. Asmussen, “Comparison of pulsed and CW regimes of MPACVD reactor operation,” Diamond and Related Materials, 12, 272-276, 2003.
34) Y. Li, M.H. Gordon, L.A. Roe, K. Hassouni, T. A. Grotjohn, “Two-dimensional self-consistent microwave argon plasma simulation with experimental verification,” J. Appl. Phys., 94, 85-95, 2003.
35) D. K. Reinhard, T. A. Grotjohn, M. Becker, M. K. Yaran, T. Schuelke, and J. Asmussen, “Fabrication and properties of ultranano, nano, and microcrystalline diamond membranes and sheets,” J. Vacuum Sci. and Technol. B, 22, 2811-2817, 2004.
36) T. A. Grotjohn, R. Liske, K. Hassouni and J. Asmussen, “Scaling behavior of microwave reactors and discharge size for diamond deposition,” Diamond and Related Materials, vol. 14, p. 288-291, 2005.
37) W.-S. Huang, D. T. Tran, J. Asmussen, T.A. Grotjohn, and D. Reinhard, Synthesis of thick, uniform, smooth ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition” Diamond and Related Materials, 15, 341-344, 2006.
38) S. Ahmed, R. Liske, T. Wunderer, M. Leonhardt, R. Ziervogel, C. Fansler, T. Grotjohn, J. Asmussen and T. Schuelke, “Extending the three-omega method to the MHz range for thermal conductivity measurements of diamond thin films”, Diamond and Related Materials, 15, 389-393, 2006.
39)K. W. Hemawan, C. L. Romel, S. Zuo, I. S. Whicman, T. A. Grotjohn, and J. Asmussen, “Microwave plasma-assisted premixed flame combustion”, Appl. Phys. Letters, 89, 141501, 2006.
40) K. Hassouni, G. Lombardi, X. Duten, G. Haagelar, F. Silva, A. Gicquel, T. A. Grotjohn, M. Capitelli, and J. Ropcke, “Overview of the different aspects in modeling moderate H2 and H2/CH4 microwave discharges,” Plasma Sources Science and Technology, 15, 117-125, 2006.
41) D. T. Tran, W.-S. Huang, J. Asmussen, T. A. Grotjohn, and D. Reinhard, “Synthesis of ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition” accepted as an invited paper for the special issue( nanocrystalline diamond) of New Diamond and Frontier Carbon Technology, Japan, 2007.
Book Sections/Chapters 1) T. Grotjohn, "Semiconductor Devices," section in Magill's Survey of Science: Applied Science, Salem Press, pp. 2290-2296, 1993.
2) T. Grotjohn, "Electronic Materials Production," section in Magill's Survey of Science: Applied Science, Salem Press, pp. 821-827, 1993.
3) T. Grotjohn, "Electromagnetic Field Modeling of Diamond CVD Reactors," in Handbook of Industrial Diamond and Diamond Films, ed. M. Prelas, G. Popovici, and K. Bigelow, Marcel Dekker, New York, pp. 673-696, 1998.
4) T. Grotjohn, "Hot Electron Effects" in Wiley Encyclopedia of Electrical and Electronics Engi-neering, Feb. 1999.
5) T. A. Grotjohn and J. Asmussen, "Microwave Plasma-Assisted Diamond Film Deposition," Diamond Films Handbook, ed. J. Asmussen and D. K. Reinhard, Marcel Dekker, New York, 90+ pages, 2001.
Conference Publications 1) T. A. Grotjohn and B. Hoefflinger, "A Parametric Submicron MOS Transistor Model for Weak- Strong Inversion and Punch-through," IEEE 1983 Custom Integrated Circuits Conference, Rochester, New York, pp. 204-208, 1983.
2) T. A. Grotjohn and B. Hoefflinger, "Efficient and Accurate Simulation of Micron and Submi-cron MOS Circuits," IEEE 1987 Custom Integrated Circuits Conference, Portland, Oregon, pp. 396-399, May 1987.
3) K. Clark (undergraduate student), T. A. Grotjohn (faculty sponsor) and J. Asmussen (faculty sponsor), "Improvement of the Magnetic Field Configuration in an ECR Plasma Source," Argonne Undergraduate Research Conference, November 1990.
4) J. Asmussen, D. K. Reinhard and T. A. Grotjohn, "Measured Characteristics and Properties of Multipolar ECR Plasmas," Washington Materials Forum, Washington D.C., Feb., 1991.
5) G. King, T. Grotjohn and J. Asmussen, "Ion Energies in a MPDR ECR Source Measured by Laser Induced Fluorescence," IEEE Plasma Science Conference, Williamsburg, VA, June, 1991.
6) T. Grotjohn and W.-Y. Tan, "Numerical Modeling of an ECR Ion Source," IEEE Plasma Sci-ence Conference, Williamsburg, VA, June 1991.
7) P. Mak, G. King, J. Hopwood, T. Grotjohn, and J. Asmussen, "Influence of Static Magnetic Field Configuration and EM Field Pattern on ECR Discharge Performance," IEEE Plasma Sci-ence Conference, Williamsburg, VA, June 1991.
8) A. K. Srivastava, M. Dahimene, T. Grotjohn and J. Asmussen, "Operational Performance of a Compact Coaxial ECR Plasma Source for MBE Applications," IEEE Plasma Science Confer-ence, Williamsburg, VA, June 1991.
9) C.-J. Huang, C. J. Sun, T. A. Grotjohn, D. K. Reinhard and C. C. Yu, "Temperature Depen-dence and Post-stress Recovery of Hot Electron Degradation Effects in Bipolar Transistors," IEEE Bipolar Circuits and Technology Meeting, Minneapolis, MN, Sept. 1991.
10) T. A. Grotjohn, "Numerical Modeling of an ECR Ion Source," 4th International Conference on Ion Sources, Bensheim, Germany, Sept. 1991.
11) A. K. Srivastava, M. Dahimene, T. Grotjohn, and J. Asmussen, "Experimental Characteriza-tion of a Compact ECR Ion Source," 4th International Conference on Ion Sources, Bensheim, Germany, Sept. 1991.
12) P. Mak, G. King, T. Grotjohn, and J. Asmussen, "Investigation of the Influence of Electro-magnetic Excitation in ECR Discharge Properties," 38th Annual Symposium and Topical Conferences of the American Vacuum Society, Seattle, Nov. 1991.
13) G. King, D. Sze, P. Mak, T. A. Grotjohn, and J. Asmussen, "Ion and Neutral Energies in a Multipolar ECR Plasma Source," 38th Annual Symposium and Topical Conferences of the American Vacuum Society, Seattle, Nov. 1991.
14) T. A. Grotjohn and J. Asmussen, "Comparison of Diamond Deposition Processing Technologies," Invited Talk, Diamond and Diamond-like Films Workshop, Breckenridge, CO, March 1992.
15) G. L. King, P. Mak, T. A. Grotjohn and J. Asmussen, "Experimental Study of the Influence of Plasma Confinement Conditions on Ions in a Multipolar ECR Plasma Reactor," 1992 IEEE International Conference on Plasma Science, Tampa, FL, June 1992.
16) W. Tan, P. Mak and T. A. Grotjohn, "Analysis of the Electromagnetic Excitation of the Dis-charge in an ECR Multipolar Plasma Source," 1992 IEEE International Conference on Plasma Science, Tampa, FL, June 1992.
17) P. Mak, W. Tan, F. C. Sze, T. A. Grotjohn, and J. Asmussen, "Study of the Electron Gas Behavior in an ECR Multipolar Plasma Source," 1992 IEEE International Conference on Plasma Science, Tampa, FL, June 1992.
18) J. Zhang, G. King, T. Grotjohn, J. Asmussen, and C. L. Chang, "Diagnostic Measurements of a Resonant Cavity Microwave Plasma Diamond Deposition Reactor," Third International Conference on the New Diamond Science and Technology, Heidelberg, Germany, August 1992.
19) P. Mak, G. King, M. Ulczynski, J. Zhang, T. Grotjohn and J. Asmussen, "Experimental Diagnosis of Low-pressure Microwave Discharges During Diamond Thin Film Deposition," Third International Conference on the New Diamond Science and Technology, Heidelberg, Germany, August, 1992.
20) C. J. Huang, T. A. Grotjohn, D. K. Reinhard, C. J. Sun and C. C. W. Yu, "Simulation of Hot Electron-induced Degradation in Silicon Bipolar Transistors," 1992 Bipolar Circuits and Technology Meeting, Minneapolis, MN, October, 1992.
21) V. Gopinath, G. T. Salbert, T. A. Grotjohn, and D. K. Reinhard, "ECR Sputter Cleaning and Removal of Silicon Dioxide Layers on Silicon Wafers," 39th National AVS Symposium and Topical Conferences, Chicago, November 1992.
22) G. L. King, P. Mak, T. A. Grotjohn, and J. Asmussen, "SF6-Argon Plasma Properties and Behavior in a Multipolar ECR Plasma Source," 39th National AVS Symposium and Topical Conferences, Chicago, November 1992.
23) W. Tan, V. Gopinath, and T. A. Grotjohn, "Multipolar Permanent Magnet ECR Plasma Source Modeling," 39th National AVS Symposium and Topical Conferences, Chicago, November 1992.
24) T. Theissen, J. Zhang, T. A. Grotjohn, and J. Asmussen, "Comparison of Film Thickness Measurement Techniques," 4th Annual Diamond Technology Workshop, Madison, Wisconsin, March, 1993.
25) G. L. King and T. A. Grotjohn, "Discharge Temperature and Species Concentration Measurements in a Resonant Cavity Microwave Plasma Diamond Deposition Reactor," 4th Annual Diamond Technology Workshop, Madison, Wisconsin, March, 1993.
26) T. A. Grotjohn, G. L. King, W. Tan, and V. Gopinath, "Modeling and Characterization of Hydrogen and Hydrogen-Argon Discharges in Resonant Cavity Microwave Plasma Reactors," 1993 IEEE International Conference on Plasma Science, Vancouver, British Columbia, June, 1993.
27) J. Asmussen and T. A. Grotjohn, "Plasma Processing Studies at Michigan State University," Plasma Etching Workshop on Electron Cyclotron Resonance Etchers and Other High Density Devices, University of Wisconsin, Madison, WI, June 1993.
28) T. A. Grotjohn, "Ion Sources for Microfabrication," Invited Paper, Fifth International Conference on Ion Sources, Beijing, China, August, 1993.
29) T. A. Grotjohn, V. Gopinath, A. K. Srivastava, and J. Asmussen, "Modeling and Characterization of Hydrogen and Helium Discharges in a Compact ECR Ion/Free Radical Source," Fifth International Conference on Ion Sources, Beijing, China, August, 1993.
30) C. J. Sun, T. A. Grotjohn, C.-J. Huang, D. K. Reinhard, and C. C. W. Yu, "BJT Forward Bias Degradation Effects and Mechanisms: A Gain and Noise Study," 1993 Bipolar/BiCMOS Circuits and Technology Meeting, Minneapolis, Minnesota, October, 1993.
31) G. L. King and T. A. Grotjohn, "Species Concentration and Temperature Measurements in a Microwave Hydrogen-Methane Diamond Deposition Discharge," 40th National AVS Sympo-sium, Orlando, Florida, November, 1993.
32) W. Tan and T. Grotjohn, "Modeling and Characterization of the Electromagnetic Excitation of Hydrogen Discharges in Microwave Plasma Reactors," 40th National AVS Symposium, Orlando, Florida, November, 1993.
33) T. A. Grotjohn, G. L. King, and W. Tan, "Microwave CVD of Diamond: Plasma Diagnostics and Deposition Reactor Modeling," 5th Annual Diamond Technology Workshop, Troy, MI, May, 1994.
34) G. L. King and T. A. Grotjohn, "Statistical Models of Ion Energy, Ion Density and Neutral Species Temperature in a Multipolar ECR Argon-SF6 Discharge," 21st IEEE International Con-ference on Plasma Science, Santa Fe, New Mexico, June 1994.
35) W. Tan and T. A. Grotjohn, "Modeling the Electromagnetic Fields and the Plasma Excitation in Moderate Pressure Microwave Cavity Plasma Sources," 21st IEEE International Conference on Plasma Science, Santa Fe, New Mexico, June 1994.
36) V. Gopinath and T. A. Grotjohn, "ECR Ion/Free-radical Plasma Source Simulation in Two and Three Dimensions," 21st IEEE International Conference on Plasma Science, Santa Fe, New Mexico, June 1994.
37) T. A. Grotjohn, G. L. King, and W. Tan, "Microwave CVD of Diamond: Plasma Diagnostics and Deposition Reactor Modeling," Fourth International Conference of the New Diamond Science and Technology, Kobe, Japan, July 1994.
38) T. A. Grotjohn, G. L. King, and W. Tan, "Microwave Plasma Processing Machine Modeling and Diagnostics for Plasma-assisted Chemical Vapor Deposition," International Workshop on Microwave Plasmas and Its Applications, Moscow, Russia, Sept. 1994.
39) T. A. Grotjohn, V. Gopinath, Y.-K. Chu and D. T. Rover, "Microwave ECR Plasma Source Simulation in Three Dimensions," International Workshop on Microwave Plasmas and Its Applications, Moscow, Russia, Sept. 1994.
40) T. A. Grotjohn "Modeling the Electromagnetic Field Excitation of High Density Plasma Sources," 41st American Vacuum Society Symposium, Denver, Colorado, Oct. 1994.
41) V. Gopinath, T. Grotjohn, Y.-K. Chu, and D. Rover, "Parallelization and Performance of Three-dimensional Plasma Simulations," Frontiers’95: The Fifth Symposium on the Frontiers of Massively Parallel Computation, McLean, Virginia, Feb. 1995.
42) V. Gopinath, T. A. Grotjohn, D. T. Rover, Y.-K. Chu, "Three-dimensional Plasma Simulations on Massively Parallel Processors," Seventh SIAM Conference on Parallel Processing for Scientific Computing, San Francisco, CA, Feb. 1995.
43) T. A. Grotjohn, L. Watson, and M.-H. Tsai, "Diamond-like Carbon Deposition Using a Multipolar ECR Plasma Source," 6th Annual Diamond Technology Workshop, Troy, MI, May, 1995.
44) T. A. Grotjohn and T. Kao, "Electromagnetic Modeling of Microwave and RF Plasma Sources," IEEE International Conference on Plasma Science, Madison, Wisconsin, June, 1995.
45) J. Mossbrucker and T. A. Grotjohn, "Determination of the Preferred Crystal Orientation of Diamond Films Using Polarized Raman Spectra," Applied Diamond Conference, Gaithersburg, Maryland, Aug. 1995.
46) T. A. Grotjohn, "Microwave ECR Ion Source Modeling," 6th International Conference on Ion Sources, Whistler, British Columbia, Canada, Sept., 1995.
47) P. Mak, M.-H. Tsai, J. Natarajan, B. L. Wright, T. A. Grotjohn, F. Salam, M. Siegel, and J. Asmussen, "Investigation of Multipolar ECR Plasma Source Sensors and Models for Process Control," 42nd American Vacuum Society National Symposium, Minneapolis, Minnesota, Oct. 1995.
48) T. A. Grotjohn and J. Asmussen, "Numerical Simulation of Resonant Cavity Microwave Systems for Materials Processing," Materials Research Society Symposium: Spring 1996, San Francisco, April 8-12, 1996. Reviewed paper appears in MRS Symposium Proceedings Volume
430: Microwave Processing of Materials V, 1996.
49) T. A. Grotjohn, M. Welter, and J. Mossbrucker, "Modeling and Diagnostics of a Microwave Plasma Resonant Cavity Reactor Used for Diamond Film Deposition," 1996 IEEE International Conference on Plasma Science, Boston, June, 1996.
50) B. K. Kim and T. A. Grotjohn, "Investigation of an ECR Plasma Source used for the Deposi-tion of Diamond-like Carbon Films," 1996 IEEE International Conference on Plasma Science, Boston, June, 1996.
51) G. Erten, A. Gharbi, F. Salam, T. Grotjohn, and J. Asmussen, "Using Neural Networks to Control the Process of Plasma Etching and Deposition," IEEE Proceedings of International Conference on Neural Networks," June 1996.
52) T. A. Grotjohn, "Microwave Plasma-assisted Deposition of Diamond and Diamond-like Car-bon Films," 1996 Gordon Conference on Plasma Processing Science, New Hampton, New Hampshire, August, 1996.
53) P. Mak, T. A. Grotjohn and J. Asmussen, "Experimental Investigation of Collisional and Collisionless Heatings in Low Pressure Microwave Plasma Discharges," 43rd National Symposium of the American Vacuum Society, Oct. 1996.
54) J. Mossbrucker and T. A. Grotjohn, "Determination of the Direction of Stress in a Polycrystalline Diamond Film Using Polarized Raman Spectroscopy," 43rd National Symposium of the American Vacuum Society, Oct. 1996.
55) T. A. Grotjohn, "Controlled-mode Microwave Cavity Modeling for Plasma-Aided and Solid Material Processing Applications," First World Congreee on Microwave Processing, Lake Buena Vista, Florida, Jan. 1997.
56) F. Salam, C. Piwek, G. Erten, T. Grotjohn and J. Asmussen, "Neural-based Modeling of a Plasma Processing Machine for Semiconductor Wafer Etching," 1997 AAAS Annual Meeting, Feb. 1997.
57) T. A. Grotjohn, "Modeling Electromagnetic Fields for the Excitation of Microwave Discharges Used in Materials Processing," Invited Talk, Third International Workshop on Microwave Discharges: Fundamentals and Applications, Abbaye Royale de Fontevraud, France, April 1997.
58) M.-H. Tsai and T. A. Grotjohn, "Investigation of Diagnostic Sensors and Control Models for a Conpact Ion Source," Invited Talk, 24th IEEE International Conference on Plasma Science, San Diego, May 1997.
59) T. Ikegami, T. Grotjohn, D. K. Reinhard, and J. Asmussen, "Boron Doping of Diamond and DLC Using Plasma Immersion Ion Implantation," 24th IEEE International Conference on Plasma Science, San Diego, May 1997.
60) B. K. Kim and T. A. Grotjohn, "Characterization of the Optical and Electrical Properties of Amorphous Carbon Films," Fall 1997 Materials Research Society Meeting, Boston, Dec. 1997.
61) T. A. Grotjohn, "Microwave Discharge Heating, Stability, and Control for Plasma-assisted Materials Processing," 1998 NSF Design and Manufacturing Grantees Conference, Monterrey, Mexico, Jan. 1998.
62) B. K. Kim and T. A. Grotjohn, "Plasma Discharge Properties of Methane-Argon and Acety-lene-Argon Discharges," 25th IEEE International Conference on Plasma Science, Raleigh, North Carolina, June 1998.
63) D. Story, T. A. Grotjohn, J. Asmussen, A. Vikharev, and A. Gorbachev, "Electron Density Measurements of Moderate Pressure Microwave-generated Hydrogen Discharges," 25th IEEE International Conference on Plasma Science, Raleigh, North Carolina, June 1998.
64) K. Hassouni, A. Gicquel, and T. A. Grotjohn, "Self-consistent Microwave Field and Plasma Discharge Simulations for a Moderate Pressure Hydrogen Discharge Reactor," 25th IEEE International Conference on Plasma Science, Raleigh, North Carolina, June 1998.
65) M.-H. Tsai and T. A. Grotjohn, "Diagnostic Measurements and Models of a Compact Ion Source," 25th IEEE International Conference on Plasma Science, Raleigh, North Carolina, June 1998.
66) M. Perrin, T. A. Grotjohn, and J. Asmussen, "Heating in Low Pressure Microwave Plasmas," 25th IEEE International Conference on Plasma Science, Raleigh, North Carolina, June 1998.
67) T. A. Grotjohn, M. H. Tsai, and T.-Y. Kao, "Self-consistent Microwave Field and Plasma Discharge Simulations for Materials Processing Reactors," 33rd Microwave Power Symposium, Chicago, July 1998.
68) A. Gicquel, K. Hassouni, and T. A. Grotjohn, "Self-consistent Modeling of a Microwave Plasma Reactor Used for Diamond Deposition," International Interdisciplinary Conference, Frontiers in Diamond Technology ’98: Research and Applications, La Jolla, CA, Sept. 1998.
69) T. A. Grotjohn, "Modeling of Microwave Discharges for Materials Processing Reactors," Gordon Research Conf.: Plasma Processing Science, Tipton, New Hampshire, August 1998.
70) T. A. Grotjohn and J. Asmussen, "Microwave Discharge Heating and Stability for Plasma- Assisted Processing Sources," 1999 NSF Design and Manufacturing Grantees Conf., Long Beach, CA, Jan. 1999.
71) M. Perrin, T. A. Grotjohn and J. Asmussen, "Investigation of Unmagnetized Plasma Heating in a Low Pressure Microwave Discharge," 1999 IEEE International Conference on Plasma Science, Monterey, California, June 1999.
72) M.-H. Tsai and T. A. Grotjohn, "Hydrogen and Hydrogen-Argon Discharge Measurements and Models of a Compact Microwave ECR Plasma Source," 1999 IEEE International Conference on Plasma Science, Monterey, California, June 1999.
73) T. A. Grotjohn, J. Asmussen, J. Sivagnaname, D. Story, A. L. Vikharev, A. Gorbachev, and
A. Kolysko, "Electron Density in Moderate Pressure Diamond Deposition Discharges," 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Prague, Czech Republic, Sept. 1999.
74) T. A. Grotjohn, W. S. Huang, J. Sivagnaname, J. Asmussen, "Plasma Diagnostic Measure-ments and Numerical Modeling of Argon-Hydrogen-Methane Discharges Used for Nanocrystal-line Diamond Deposition in a Microwave CVD System," 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Prague, Czech Republic, Sept. 1999.
75) B. K. Kim and T. A. Grotjohn, "Amorphous Carbon Films Grown from Methane/Argon and Acetylene/Argon ECR-CVD Discharges," 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Prague, Czech Republic, Sept. 1999.
76) M. Farhan, V. M. Ayres, A. Khan, C. Adinata, M. Bataineh, T. Grotjohn, B. L. Wright, and
J. Asmussen, "Development of FTIR Emission Spectroscopy and Controls for Optimized Diamond and Diamond-like Film Deposition," 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Prague, Czech Republic, Sept. 1999.
77) B. K. Kim and T. A. Grotjohn, "Investigation of the Plasma Properties and Fluxes in a Hydrogenated Amorphous Carbon Deposition Process," 46th International Symposium of the American Vacuum Society, Oct. 1999, Seattle, Washington.
78) K. Hassouni, T. A. Grotjohn, and A. Gicquel, "Self-consistent Modeling of Moderate Pressure H2 Plasmas Obtained in Diamond Deposition Microwave Reactor," 1999 Joint International Meeting of The Electrochemical Society, Honolulu, Hawaii, Oct. 1999.
79) Y. Li, M. H. Gordon, L. A. Roe, K. Hassouni, and T. Grotjohn, "Absorption Measurements of 4s State Number Density for a Microwave Argon Plasma," 1999 Gaseous Electronics Conference, Norfolk, VA, Oct. 1999.
80) M. Perrin, T. A. Grotjohn and J. Asmussen, "Comparison of Magnetized and Non-magnetized Low Pressure Microwave Discharges," 2000 NSF Design and Manufacturing Conference, Vancouver, Jan. 2000.
81) T. Grotjohn, "Modeling of the Plasma Heating in Unmagnetized Low Pressure Microwave Discharges," 2000 IEEE International Conference on Plasma Science, New Orleans, June, 2000.
82) P. W. Rummel and T. A. Grotjohn, "Improved Utility of Microwave Energy for Semiconductor Plasma Processing through RF System Stability Analysis," 2000 IEEE International Conference on Plasma Science, New Orleans, June, 2000.
83) M. Perrin, T. A. Grotjohn and J. Asmussen, "The Effect of Static Magnetic Field Configuration on the Ion Production Efficiency and Operational Stability of a Microwave Plasma Source," 2000 IEEE International Conference on Plasma Science, New Orleans, June, 2000.
84) W. S. Huang, T. A. Grotjohn and J. Asmussen, "Plasma Diagnostic Measurements of Argon-Hydrogen-Methane Discharges for Ultra-Nanocrystalline Diamond Deposition in a Microwave CVD System," 2000 IEEE International Conference on Plasma Science, New Orleans, June, 2000.
85) T. A. Grotjohn, Invited Presentation, "Modeling and Scaling of Microwave Plasma Discharges and Reactors for Diamond Deposition," Gordon Research Conference on Diamond Synthesis, Newport, Rhode Island, June 2000.
86) T. A. Grotjohn, "Modeling of the Plasma Heating in Unmagnetized Low Pressure Microwave Discharges," Gordon Research Conference on Plasma Processing Science, Tilton, New Hampshire, Aug. 2000.
87) T. A. Grotjohn, "Modeling and Control of ECR and Unmagnetized Microwave Plasmas Used for Materials Processing," IV International Workshop on Microwave Discharges: Fundmentals and Applications, Zvenigorod, Russia, Sept. 2000.
88) J. Asmussen, M. Perrin and T. A. Grotjohn, "A Comparison of Magnetized and Non-Magnetized Low Pressure Microwave Discharges," IV International Workshop on Microwave Discharges: Fundmentals and Applications, Zvenigorod, Russia, Sept. 2000.
89) P. W. Rummel and T. A. Grotjohn, "Improved Utility of Microwave Energy for Semiconductor Plasma Processing through RF System Stability Analysis and Enhancement," American Vacuum Society- 47th International Symposium, Boston, Oct. 2000.
90) T. A. Grotjohn and J. Asmussen, "Electron Gas Heating in Low-Pressure, Unmagnetized Microwave Plasmas Used for Materials Processing," 2001 NSF Design, Manufacturing and Industrial Innovation Research Conference, Tampa, Florida, Jan. 2001.
91) J. Asmussen, D. Story and T. Grotjohn, "Experimental Investigation of Mini-Microwave Plasma Sources," Pulsed Power Plasma Science Conference, Las Vegas, Jun. 2001.
92) T. A. Grotjohn and S. Curtin, "Self-Consistent Modeling of Low Pressure Microwave Discharges Including Non-Collisional Heating Processes," Pulsed Power Plasma Science Conference, Las Vegas, Jun. 2001.
93) J. Asmussen, T. A. Grotjohn and A. "Wijaya, Experimental and Numerical Model Investigations of Miniature Microwave Plasma Sources," American Vacuum Society-48th International Symposium, San Fransisco, Oct. 2001.
94) T. A. Grotjohn and J. Asmussen, "Scaling of Microwave Plasma Sources to Small Dimensions," 2002 NSF Design, Service and Manufacturing Grantees and Research Conference, San Juan, Puerto Rico, Jan. 2002.
95) T. A. Grotjohn, "Modeling of Miniature Microwave Plasma Sources," 29th IEEE International Conference on Plasma Science, Banff, Canada, May 2002.
96) A. Wijaya, S. Zuo, T. A. Grotjohn, and J. Asmussen, "Miniature Microwave Plasma Sources Based on Microstripline Designs," ," 29th IEEE International Conference on Plasma Science, Banff, Canada, May 2002.
97) S. Zuo, T. A. Grotjohn and J. Asmussen, "Unbounded and Bounded Microwave Plasma Generated by a Monopole Antenna Structure," 29th IEEE International Conference on Plasma Science, Banff, Canada, May 2002.
98) T. A. Grotjohn, J. Asmussen, D. Story, S. Zuo, and J. Narendra, “ Creation and Characteristics of Miniature Microwave Plasmas,” Gordon Research Conference on Plasma Processing Science, Tilton, New Hampshire, Aug. 2002.
99) A.L. Vikharev, A.M. Gorbachev, V.A. Koldanov,R.A. Akhmedzhanov, D.B Radishchev, T.
A. Grotjohn, S. Zuo, J. Asmussen, “Comparison of Pulsed and CW Regimes of MPACVD Reactor Operation,” Diamond 2002 Conference, Granada, Spain, Sept. 2002.
100) T. A. Grotjohn, D. Story, S. Zuo, J. Narendra, A. Wijaya, and J. Asmussen, “Characteristics of Miniature Microwave Excited Plasma Discharges” American Vacuum Society-49th International Symposium, Denver, Oct. 2002.
101) T. A. Grotjohn, J. Narendra, S. Zuo, A. Wijaya, D. Story and J. Asmussen, “Microwave Power Coupling Principles for Generating Small Microwave Plasmas,” American Vacuum Society-49th International Symposium, Denver, Oct. 2002.
102) M. Perrin, T. A. Grotjohn, J. Asmussen, “A Comparison of the Performance Between Low Pressure Magnetized and Non-magnetized Microwave Discharges,” American Vacuum Society49th International Symposium, Denver, Oct. 2002.
103) T. A. Grotjohn, J. Asmussen, and J. Narendra, “Microstripline Applicator for Generating Microwave Plasma Discharges,” 2003 NSF Design, Service and Manufacturing Grantees and Research Conference, Birmingham, Alabama, Jan. 2003.
104) T. A. Grotjohn, J. Asmussen, G. M. Swain, S. Zuo and A. L. Vikharev, “Investigation of the Scaling and Control of Microwave Discharges for Diamond Deposition on Substrates of Various Sizes and Shapes,” Eighth International Symposium on Diamond Materials as a part of the 203rd Meeting of The Electrochemical Society, Paris, France, April 27-May 2, 2003.
105) J. Asmussen and T. A. Grotjohn, “Progress in Microwave Plasma-Assisted Deposition of Diamond”, 5th -International Workshop on Microwave Discharges: Fundamentals and
Application, Greifswald, Germany, July 8-12, 2003
106) T. A. Grotjohn, J. Narendra, S. Zuo, and J. Asmussen, “Scaling of Microwave Plasma Sources to Small Dimensions,” Invited Paper, 5th -International Workshop on Microwave Discharges: Fundamentals and Application, Greifswald, Germany, July 8-12, 2003.
107) T. A. Grotjohn, A. Moon, M. K. Yaran, T. Schuelke, D. K. Reinhard and J. Asmussen, “Mechanical Properties of Ultranano-, Nano- and Poly-crystalline Diamond Films and Membranes,” 50th International AVS Symposium, Baltimore, Nov. 2003.
108) T. A. Grotjohn, J. Narendra and J. Asmussen, “Creation and Characteristics of Miniature Microwave Plasmas,” 50th International AVS Symposium, Baltimore, Nov. 2003.
109) T. A. Grotjohn, K. Hemawan, S. Zuo and J. Asmussen, “Miniature Atmospheric Pressure Microwave Plasma Torch Applicators and Characteristics,” 50th International AVS Symposium, Baltimore, Nov. 2003.
110) D. K. Reinhard, M. Becker, R.A. Booth, T.A. Grotjohn, and J. Asmussen, “Fabrication and Properties of Ultra-nano, Nano, and Polycrystalline Diamond Membranes and Sheets,” 50th International AVS Symposium, Baltimore, Nov. 2003.
111) T. A. Grotjohn and J. Asmussen, “Scaling of Microwave Plasma to Small Dimensions,” 2004 NSF Design, Service and Manufacturing Grantees and Research Conference, Dallas, Texas, Jan. 2004.
112) J. J. Narendra, T.A. Grotjohn, and J. Asmussen, “Temperature and Density Measurements of Miniature Microwave Plasma Discharges,” IEEE International Conference on Plasma Science, Baltimore, June 2004.
113) Stanley Zuo, K. Hemawan, J.J. Narendra, T. A. Grotjohn and J. Asmussen, “Miniature Microwave Plasma Torch Applicator and its Characteristics,” IEEE International Conference on Plasma Science, Baltimore, June 2004.
114) T. Schuelke, M. Becker, T. A. Grotjohn, and Jes Asmussen, “The Vacuum Arc Plasma Source and its Applications,” IEEE International Conference on Plasma Science, Baltimore, June 2004.
115) K.W. Hemawan, T.A. Grotjohn, and J. Asmussen, “Atmospheric Microwave Discharges for Plasma Treatment of Fibers,” IEEE International Conference on Plasma Science, Baltimore, June 2004.
116) T. A. Grotjohn, S. Zuo, K. Hemawan, J. J. Narendra, and J. Asmussen, “Design and Operating Characteristics of a Miniature Microwave Plasma Torch,” Gordon Research Conference on Plasma Processing Science, New Hampshire, Aug. 2004.
117) T. Grotjohn, R. Liske, J. Narendra, K. Hassouni, J. Asmussen, “Scaling behavior of microwave reactor and discharge size for diamond deposition,” 15th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides, Riva del Garda, Italy, Sept. 2004.
118) R. Liske, J. Fricke, M. Steinecke, J. Asmussen, T. Grotjohn, D. Reinhard, T. Schuelke, “Diamond CVD on Large Area Substrates in a 915 MHz Microwave Reactor,” 15th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides, Riva del Garda, Italy, Sept. 2004.
119) W.S. Huang, D. T. Tran, J. Asmussen, T.A.Grotjohn, and D.Reinhard, “Synthesis of Large Area, Thick, Uniform, Smooth Ultrananocrystalline Diamond Films by Microwave Plasma Assisted Chemical Vapor Deposition,” Applied Diamond Conference, Chicago, May 2005.
120) S. Zuo, T. Grotjohn, D. Reinhard,, J. Asmussen, and R. Ziervogel, “Deposition and Post-Processing of Polycrystalline Diamond for Freestanding Films and Substrates,” Applied Diamond Conference, Chicago, May 2005.
121) R. Liske, T. Wunderer, M. Leonhardt, T.A. Grotjohn, J. Asmussen and T. Schuelke, “Extending the 3-Omegs method to the megahertz range for thermal conductivity measurements of diamond thin films”, presented at the 8th Applied Diamond Conference Nanocarbon 2005, Argonne Nat. Lab. Argonne, Ill., May 15-19, 2005.
122) J. Narendra, D. Tran, H. Chen, J. Zhang, T. A. Grotjohn, J. Asmussen and N. Xi, “Local area materials processing using microstripline-based miniature microwave discharge,” 2005 IEEE International Conference on Plasma Science, Monterey, California, June 2005.
123) K. W. Hemawan, S. Zuo, C. L. Romel, T. A. Grotjohn, I. Wichman, E. Case and J. Asmussen, “plasma-assisted combustion in a microwave applicator plasma torch applicator,” 2005 IEEE International Conference on Plasma Science, Monterey, California, June 2005.
124) S. Zuo, T. Grotjohn, D. Reinhard,, J. Asmussen, and R. Ziervogel, “Deposition and Post-Processing of Polycrystalline Diamond for Freestanding Films and Substrates,” Diamond 2005-European Diamond Conference, Toulouse, France, Sept. 2005.
125) D. T. Tran, W.S. Huang, J. Asmussen, T.A.Grotjohn, and D.Reinhard , “Synthesis of thin and thick ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition,” Diamond 2005-European Diamond Conference, Toulouse, France, Sept. 2005.
126) K. W. Hemawan, C. L. Romel, S. Zuo, I. S. Wichman, T. A. Grotjohn and J. Asmussen, ”Microwave plasma-assisted premixed flame combustion,“ Central States Section Meeting of the Combustion Institute, Cleveland, 2006.
127) K.W. Hemawan, S. Zuo, C. L. Romel, I. S. Wichman, T. A. Grotjohn, and J. Asmussen, “Microwave Plasma-assisted Premixed Flame Combustion”, presented at the 3rd International Workshop on Microplasmas, Greifswald, Germany, May 9-11, 2006, also a written summary was included in the IWM 2006 Workshop Proceedings.
128) J. Narendra, D. Tran, J. Zhang, T.Grotjohn, J. Asmussen and N. Xi, presented at the 3rd International Workshop on Microplasmas, Greifwald, Germany, May 9-11, 2006.
129) T. Grotjohn, D. T. Tran, J. Asmussen, “Synthesis and Characterization of Nanocrystalline Diamond Films Including Conducting Films,” Joint International Conference on New Diamond Science and Technology and the Applied Diamond Conference, Research Triangle Park, NC, 2006.
130) M.A. Perrin, T. A. Grotjohn,D. Reinhard, J. Asmussen, and J. Wander, “Evaluation of an end feed microwave cavity plasma source for diamond etching”, presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006.
131) K. W. Hemawan, C. L. Romel, S. Zuo, T. A. Grotjohn, I.S. Wichman, and J. Asmussen, “Plasma- assisted combustion in a miniature microwave plasma torch applicator”, presented at the 2006 IEEE International Conference on Plasma Science, Traverse City, MI., 2006.
132) J. Narendra, Y. Gu, J. Zhang, T.A. Grotjohn, N. Xi and J.Asmussen, “Local area materials etching using microstripline-based miniature microwave discharge,” presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006.
133) D. T. Tran, T. A. Grotjohn and J. Asmussen, “Synthesis of ultrananocrystalline diamond films by a microwave plasma-assisted chemical vapor deposition system”, presented at the 2006 IEEE International Conference on Plasma Science, June 4-8,Traverse City, MI., 2006.
134) S. Zuo, T. A. Grotjohn, D. Reinhard and J. Asmussen, “Deposition and post-processing of polycrystalline diamond for freestanding films and substrates,” presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI. 2006.
135) F. Marti, P. Miller, M. Becker, D. Tran, S. Zhou, J. Asmussen, T.A. Grotjohn and D. Reinhard, “Diamond Electron Stripping foils for high energy ion beams”, presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006.
136) J. J.Narendra, D. Tran, J. Zhang, T. A. Grotjohn, J. Asmussen, N. Xi, ”Miniature microwave plasma for localized etching,“ NSF DMI Grantees Conference, St. Louis, 2006.
137) T. A. Grotjohn, J. Asmussen, S. Zuo, J. J. Narendra, “Scaling of Microwave Plasma Sources to Small Dimensions,“ NSF DMI Grantees Conference, St. Louis, 2006.
138) T.A. Grotjohn, J. Narendra, J. Zhang, J. Asmussen and N. Xi, “Miniature microwave plasma discharge for local area materials processing”, presented at the VI International Workshop on Microwave Discharges: Fundamentals and Applications, September 11-15, Zvenigorod, Russia, 2006.
139) S. Zuo, M. K. Yaran, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, “Investigation of diamond deposition uniformity and quality for freestanding film and substrate applications”, presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006.
140) R. Ziervogel, M. F. Becker, T. Schuelke, J. Asmussen, T.A. Grotjohn and D. K. Reinhard, “ Deposition uniformity of ultrananocrystalline diamond on 150 and 200 mm wafer substrates”, presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006.
141) J. J. Narendra, D. Tran, J. Zhang, T. A. Grotjohn, J. Asmussen, and N. Xi, “Miniature microwave plasma for localized etching,” Gordon Research Conference on Plasma Processing Science, Massachusetts, 2006.
142) K. Hemawan, C. Romel, S. Zuo, I. Wichman, T. Grotjohn, and J. Asmussen, “Plasma-assisted combustion in a miniature microwave plasma torch application,” Gordon Research Conference on Plasma Processing Science, Massachusetts, 2006.
Patents
Ph.D. Dissertations and M.S. Theses Advised
C.-J. Huang, MS Thesis, "A Compact Non-quasi-static MOSFET Device Model," 1988.
Y.-T. Tsai, Ph.D., "AC Simulation of Field Effect Transistors with a Hydrodynamic Transport Model," 1990.
G. L. King, MS Thesis, "Implementation and Testing of a Laser-induced Fluorescence System for the Characterization of a Multipolar Electron Cyclotron Resonance Plasma Reactor," 1991.
C.-J. Huang, Ph.D., "An Investigation of Hot Electron Induced Degradation for Silicon Bipolar Transistors," 1992.
W.-Y. Tan, Ph.D., "Modeling the Electromagnetic Field and the Plasma Excitation in a Moderate Pressure Microwave Cavity Plasma Source," 1994.
V. P. Gopinath, Ph.D., "3D3V Simulation of Electron Cyclotron Resonance Plasmas," 1994.
G. L. King, Ph.D., "Temperature and Concentration of Ionic and Neutral Species in Resonant Cavity Plasma Discharges," 1994.
J. J. Vincent, Ph.D., "Modeling and Analysis of Radio Frequency Structures Using an Equivalent Circuit Methodology with Application to Charged Particle Accelerator RF Resonators," 1996.
J. Mossbrucker, Ph.D., "Polarized Raman Spectrum Studies of Diamond Films," Exchange pro-gram with University of Kaiserslautern, Germany, Degree granted by U. of Kaiserslautern, 1997.
Jayakumaran Sivagnaname, M.S., "Optical Emission Spectroscopy Investigation of Microwave Plasmas," 1998.
Meng-Hua Tsai, Ph.D., "Characterization and Modeling of a Compact ECR Plasma Source Designed for Materials Processing," 1999.
Paul Rummel, M.S., "Improved Utility of Microwave Energy for Semiconductor Plasma Processing Through RF System Stability Analysis and Enhancement," 2000.
Bo Keun Kim, Ph.D., "Investigation of the Film Properties and Deposition Process of a-C:H Films Deposited with a Microwave ECR Plasma Reactor, 2000.
J. Narendra, M.S., “Characteristics and Modeling of Miniature Microwave Plasma Discharges Created with Microstripline Technology,” 2004.
D. Story, Ph.D. Dissertation, “Miniature Microwave Plasmas of Hydrogen and Argon Investigated Using Optical Emission Spectroscopy,” 2005.
D. Tran, M.S. Thesis, “Synthesis of Thin and Thick Ultra-Nanocrystalline Diamond Films by Microwave Plasma CVD System,” 2005.
Yujan Gu, M. S. Thesis, “Microfabrication of an Intraocular Pressure Sensor”, 2005. (Mr. Gu was jointly advised by Prof. Asmussen and myself.).
Exchange Student Theses Directed Thomas Theissen, Diplomarbeit, exchange student from Univerisity of Kaiserslautern, "Applica-tion of Laser Reflection Interference for the Analysis of Chemical Vapor Deposited Diamond Thin Films," 1993.
Hans Born, Studienarbeit, exchange student from University of Kaiserslautern, "In-situ Tempera-ture Determination of Chemical Vapor Deposited Diamond Thin Film Through IR Emission Spectrum Investigation," 1993.
Oliver C. Klein, Studienarbeit, exchange student from University of Kaiserslautern, "Develop-ment and Construction of an Optical-based Temperature Measuring System for Monitoring Plasma Thin Film Processing," 1994.
Joerg Mossbrucker, Diplomarbeit, exchange student from University of Kaiserslautern, "Measurement and Characterization of the Raman Spectrum of Diamond Films," 1994.
Marc Welter, Diplomarbeit, exchange student from University of Kaiserslautern, "Implementa-tion and Testing of CARS as an Optical Diagnostic Tool for Temperature Measurements in a Plasma-assisted CVD-Reactor," 1996.
Stefan Kukulenz, Diplomarbeit, exchange student from University of Kaiserslautern, "Automa-tion of the Analyzing Process in Raman Spectroscopy," 1996.
Abdul-Jabbar Kader, Diplomarbeit, exchange student from University of Kaiserslautern, "Design and Analysis of Thin-Film Optical Filters," 1997.
Rudi Kaiser, Studienarbeit, exchange student from University of Kaiserslautern, "Implementation of a Control System for a Plasma Processing Reactor," 1997.
Jan Gotza, Studienarbeit, exchange student from University of Kaiserslautern, “Design of a Laser System for in-situ Measurement of the Thickness of Transparent Thin Films,” 2003 Instruction: Courses Taught
Undergraduate Level Courses
EE 301: Circuit Analysis II (Sp90) EE 302L: Circuits Laboratory (Sp95) EE 306: Electromagnetic Fields Laboratory (Sp94[3]) EE 381: Technical Communications, Professionalism and Engineering Ethics (F97,Sp96) EE 474: Principles of Solid State Devices (F04,F87[2]) EE 475: Analog Circuit Design (W92) EE 476: Electro-optics (Sum03, Sum01, Sum00,F99,Sum99,Sp99,F98,Sp98,F97,Sum97, F96,Sp96,F95,F94,F93,F92) EE 476L: Electro-optics (Lab. developed by T. Grotjohn) (Sp99[3], F97[2], F95[1], F93[1]) EE 477: Electro-optics (Quarter System) (Sp92, Sp91, Sp90, Sp89) EE 482/480: ECE Capstone Design (Sp 02,F01, F00,Sp00,F99)
Graduate Level Courses
EE 842: Quantum Electronics (developed and introduced) (F02, F00,F98, F96, F94, F92) EE/Phys 850: Plasma Physics (Sp05,Sp97, Sp95, Sp93, F91) EE 874: Physical Electronics (F90, F89, F88) EE 875: Solid State Devices I (S93, W91, W90, W88, W87) EE 876: Solid State Devices II (revised) (Sp88) EE 931B: Amorphous and Polycrystalline Materials (Sp98) EE 931C: Semiconductor Phenomena(Sp03, Sp01, Sp94, W89) EE 932: Topics in Solid-State Devices (Sp87) EE 989A: Plasma Processing (Sp04,Sum99, Sum97, Sum95, F93)
Note: [#] indicates the number of sections or lab sections taught. MSU changed from a quarter system to a semester system in 1992.
Institutional Service Activities
University Committees
University Hearing Board (6 years) 94-2000,03-06 University Research Computing Committee(2 years) (93-95) University Materials Advisory Committee (01-05)
College of Engineering Committees
College of Engineering Computer Advisory Committee (7 years, Chair 90-91) (88-95) College of Engineering Safety Committee (98-02, chair 01-02)Engineering College Advisory Council (01-present, chair 03-05)
Department Committees
EE Advisory Committee (87-88, 89-91, 92-94, 95-97, 99-01) EE Graduate Studies Committee (87-88, 88-89) EE Chairperson Search Committee (89-90, 00-01) EE Undergraduate Curriculum Committee (1 year) (92-93, 01-05) EE Computer Resource Committee (88-01) EE Planning Committee (95-01) EE Faculty Search Committee (95-96, 96-97, 97-98 Chair, 99-00) EE Graduate Student Admissions Committee (97-02, chair 01-02) ECE ABET Task Force Committee (Chair 01-05)
Administrative-Related Institutional Service
Associate Director of the Electronic and Surface Properties of Materials Center (later called MNEC) (95-01) Associate Chairperson of ECE for Undergraduate Studies, ECE (01-05) Acting Chairperson of Electrical and Computer Engineering, (6/05-present)
Professional Service Activities
Faculty Advisor for IEEE Student Branch (91-99) Vice Chair of ED, AT, MTT Chapter IEEE, Southeastern Michigan Chapter (93-97) Chair of ED, AP, MTT Chapter of IEEE, Southeastern Michigan Chapter (97-99) Session Chair at 1993 AVS SymposiumSession Chair at the Third International Workshop on Microwave Discharges, 1997 Secretary of IEEE Plasma Science and Applications Executive Committee, 99-01 Technical Area Co-coordinator for Plasma Diagnostics at the IEEE International Conference on Plasma Science, 2000, 2001 Session Organizer, Electron, Ion and Plasma Sources, at the IEEE International Conference on Plasma Science, 2004. Session Chair, International Workshop on Microwave Discharges, 2006. Conference Organizing Committee, 2006 IEEE International Conference on Plasma Science, Traverse City, Michigan. ( Conference Co-Chair) Guest associate editor for special issue in IEEE Transaction on Plasma Science.