eceheader

grotjohnTimothy Grotjohn, Professor and Chairperson top
Michigan State University
Department of Electrical & Computer Engineering
2120 Engineering Building, East Lansing, MI 48824

Office: 2120 Engineering Bldg. & C105 Engineering Research Complex
Phone: 517-353-8906 & 517-432-7127
Email: grotjohn@egr.msu.edu
Homepage: http://www.egr.msu.edu/~grotjohn/

 

Awards

Biography

Curriculum Vitae

Publications

Research

Teaching

 

Awards

Withrow Exception Service Award, College of Engineering, Michigan State University, 2005.
Withrow Distinguished Scholar Award, College of Engineering, Michigan State University, 2004.
Withrow Excellence in Teaching Award, Electrical & Computer Engineering, College of Engineering, Michigan State University, 2002.

Biography

Education:
Ph.D., Electrical Engineering, Purdue University, 1986.
M.S., Electrical Engineering, University of Minnesota, 1984.
B.E.E., Electrical Engineering, University of Minnesota, 1982.

Professional Experience:
2007-present     Chairperson, Electrical & Computer Engineering, Michigan State University

2005-2007        Acting Chairperson, Electrical & Computer Engineering, Michigan State University
2000-present     Professor, Electrical & Computer Engineering, Michigan State University
1993-2000        Associate Professor, Electrical Engineering, Michigan State University
1987-1993        Assistant Professor, Electrical Engineering, Michigan State University

Memberships:
IEEE (Senior Member), ASEE, Eta Kappa Nu, Sigma Xi, Phi Kappa Phi, Materials Research Society and American Vacuum Society.

Professional Service Activities:

Conference Organizing Committee, 2006 IEEE International Conference on Plasma Science, Traverse City, Michigan. ( Conference Co-Chair).
Session Chair, International Workshop on Microwave Discharges, 2006.
Session Organizer, Electron, Ion and Plasma Sources, at the IEEE International Conference on Plasma Science, 2004.
Technical Area Co-coordinator for Plasma Diagnostics at the IEEE International Conference on Plasma Science, 2000, 2001.

Dr. Grotjohn, a professor in the Department of Electrical and Computer Engineering at MSU since 1987, was appointed acting chairperson of the department in June 2005.  His research interests include plasma-assisted materials processing, plasma source design, modeling, diagnostics and applications, microwave plasmas, miniature and micro plasmas, computational modeling of plasma.

Curriculum Vitae

2007 - Curriculum Vitae

 Publications

Selected Publications - See the curriculum vitae (above) for full list of publications.

Journal Publications:

1. D. T. Tran, W.-S. Huang, J. Asmussen, T. A. Grotjohn, and D. Reinhard, “Synthesis of ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition” accepted as an invited paper for the special issue( nanocrystalline diamond) of  New Diamond and Frontier Carbon Technology, Japan, 2007.

2. K. Hassouni, G. Lombardi, X. Duten, G. Haagelar, F. Silva, A. Gicquel, T. A. Grotjohn, M. Capitelli, and J. Ropcke, “Overview of the different aspects in modeling moderate H2 and H2/CH4 microwave discharges,” Plasma Sources Science and Technology, 15, 117-125, 2006.

3. K. W. Hemawan, C. L. Romel, S. Zuo, I. S. Whicman, T. A. Grotjohn, and J. Asmussen,  “Microwave plasma-assisted premixed flame combustion”, Appl. Phys. Letters, 89, 141501, 2006.


4. S. Ahmed, R. Liske, T. Wunderer, M. Leonhardt, R. Ziervogel, C. Fansler, T. Grotjohn, J. Asmussen and T. Schuelke, “Extending the three-omega method to the MHz range for thermal conductivity measurements of diamond thin films”, Diamond and Related Materials, 15, 389-393, 2006.

5. W.-S. Huang, D. T. Tran, J. Asmussen, T.A. Grotjohn, and D. Reinhard, Synthesis of thick, uniform, smooth ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition” Diamond and Related Materials, 15, 341-344, 2006.

6. T. A. Grotjohn, R. Liske, K. Hassouni and J. Asmussen, “Scaling behavior of microwave reactors and discharge size for diamond deposition,” Diamond and Related Materials, vol. 14, p. 288-291, 2005.

Book Sections/Chapters:
1. T. A. Grotjohn and J. Asmussen, "Microwave Plasma-Assisted Diamond Film Deposition," Diamond Films Handbook, ed. J. Asmussen and D. K. Reinhard, Marcel Dekker, New York, 90+ pages, 2001.

2. T. Grotjohn, "Hot Electron Effects" in Wiley Encyclopedia of Electrical and Electronics Engi­neering, Feb. 1999.

3. T. Grotjohn, "Electromagnetic Field Modeling of Diamond CVD Reactors,"  in Handbook of Industrial Diamond and Diamond Films, ed. M. Prelas, G. Popovici, and K. Bigelow, Marcel Dekker, New York, pp. 673-696, 1998.

Conference Publications:
1. K. Hemawan, C. Romel, S. Zuo, I. Wichman, T. Grotjohn, and J. Asmussen, “Plasma-assisted combustion in a miniature microwave plasma torch application,” Gordon Research Conference on Plasma Processing Science, Massachusetts, 2006.

2.J. J. Narendra, D. Tran, J. Zhang, T. A. Grotjohn, J. Asmussen, and N. Xi, “Miniature microwave plasma for localized etching,” Gordon Research Conference on Plasma Processing Science, Massachusetts, 2006.

3. R. Ziervogel, M. F. Becker, T. Schuelke, J. Asmussen, T.A. Grotjohn and D. K. Reinhard, “ Deposition uniformity of ultrananocrystalline diamond on 150 and 200 mm wafer substrates”, presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006.

Patents:
1. U.S. patent (#7,147,810), Drapable diamond thin films and method for the preparation thereof, D. K. Reinhard, J. Asmussen, M. F. Becker, T. A. Grotjohn, T. Schuelke, and R. Booth.

2. U.S. patent (#6,759,808), Microwave stripline applicators, T. A. Grotjohn, J. Asmussen, and A. Wijaya.

3. U.S. patent (#6,890,300), “Implantable microscale pressure sensor system for pressure monitoring and management,” J. Lloyd, T. A. Grotjohn, A. Weber, F. Rosenbaum and G. Goodall.

Research 

Dr. Grotjohn's scholarly interests include the modeling, design, diagnostics, and control of plasma-assisted materials processes and processing machines. This work focuses on the use of models, including electromagnetic, plasma dynamic, and plasma chemistry models, for the design and control of microwave plasma reactors used for materials processing. Specific processes studied have included diamond CVD deposition, amorphous carbon deposition, semiconductor etching, and general microwave-generated plasma discharges operated as ion and radical sources. In coor­dination with the modeling studies are plasma diagnostic studies including a variety of techniques including optical emission spectroscopy, laser spectroscopy, Langmuir probes, and millimeter wave resonator diagnostics. Recent work is especially looking at mini- and micro-scale plasma discharges and their application.

Description of diamond related research: http://www.ccl-diamond.org

 

Teaching

EE 482/ECE 480: "Electrical & Computer Engineering Capstone Design"
EE/ECE 476: "Electro-optics"
EE 842: "Quantum Electronics"
EE/PHY 850: "Plasma Physics"
EE 989A: "Plasma Processsing"

Back to top