Jes Asmussen, Richard M. Hong Prof. and University Distinguished ProfessorDirector, Fraunhofer Center for Coatings and Laser Applications
Michigan State University
Department of Electrical & Computer Engineering
2120 Engineering Building, East Lansing, MI 48824
Office: B100 & C104 Engineering Research Complex
Phone: 517-355-4620
Fax: 517-353-1980
Email: asmussen@egr.msu.edu
| Awards |
Biography |
Curriculum Vitae |
Publications |
Research |
Teaching |
| Awards |
The Richard M. Hong Chaired Professor, Michigan State University, (M.S.U.), 2002 Withrow Distinguished Scholar Award, University Distinguished Professor of Electrical Engineering, M.S.U., 1997 Distinguished Service Award, Fellow, Institute of Electrical and Electronics Engineers, 1992 Distinguished Faculty Award, M.S.U., 1988 Listed in Who's Who in America 49th Edition to present, Who's Who in the World, Who's Who in Science and Engineering |
| Biography |
Education: Ph.D., Electrical Engineering, University of Wisconsin, 1967 M.S., Electrical Engineering, University of Wisconsin, 1964 B.S., Electrical Engineering, University of Wisconsin, 1960 Professional Experience: 2003 - present Executive Director of the Fraunhofer Center for Coatings and Laser Applications, Michigan State University (M.S.U.) 2002 - present The Richard M. Hong Chaired Professor, M.S.U. 2002 (Feb.- Aug.) Guest Professor of Adv. Technology for Electrical Engineering (Endowed) Chair Department of Electrical and Computer Engineering, Kumamoto University, Japan 1997 - present University Distinguished Professor of Electrical and Computer Engineering, M.S.U. 1990 - 2000 Chairperson, Department of Electrical and Computer Engineering, M.S.U. 1989 - 1990 Acting Chairperson, Department of Electrical and Computer Engineering, M.S.U. 1975 - 1996 Professor, Department of Electrical and Computer Engineering, M.S.U. 1983 - 1984 Acting Associate Director of Division of Engineering Research, M.S.U. 1973 - 1975 Associate Chairperson of the Department of Electrical Engineering, M.S.U. 1971 - 1975 Associate Professor, Department of Electrical Engineering, M.S.U. 1971 (Summer) Research Associate, Argonne National Laboratory 1967 - 1971 Assistant Professor, Department of Electrical Engineering, M.S.U. 1967 (Summer) Research Associate, Department of Electrical Engineering, University of Wisconsin 1962 - 1967 Research Assistant, Department of Electrical Engineering, University of Wisconsin 1960 - 1962 Design and Development Engineer, Louis Allis Co., Milwaukee Wisconsin Technical and Professional Society Memberships: Institute of Electrical and Electronics Engineers Executive Committee of the IEEE Plasma Science and Applications (1987-89) IEEE Nuclear and Plasma Science Society Administrative Committee (AdCom) (1997-2001) Phi Eta Sigma Tau Beta Pi Eta Kappa Nu Sigma Xi American Association for the Advancement of Science American AIAA Technical Committee on Electric Propulsion (1987 to 1994) Materials Research Society American Vacuum Society |
| Curriculum Vitae |
Curriculum Vitae |
| Publications |
Selected Publications - See the curriculum vitae (above) for full list of publications. Journal Publications: S.S. Zuo, M.K. Yaran, T.A. Grotjohn, D.K. Reinhard, and J. Asmussen, "Investigation of diamond deposition uniformity and quality for freestanding film and substrate applications," submitted to Diamond and Related Materials 2007. D.T. Tran, W.-S. Huang, J. Asmussen, T.A. Grotjohn, and D. Reinhard, "Synthesis of ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition," accepted as an invited paper for the special issue (nanocrystalline diamond) of New Diamond and Frontier Carbon Technology, Japan, 2007. K.W. Hemawan, C.L. Romel, S. Zuo, I.S. Wichman, T.A. Grotjohn, and J. Asmussen, "Microwave plasma-assisted premixed flame combustion," Applied Physics Letter, 89, 141501, 2006. S. Ahmed, R. Liske, T. Wunderer, M. Leonhardt, R. Ziervogel, C. Fansler, T. Grotjohn, J. Asmussen, and T. Schuelke, "Extending the three-omega method to the MHz range for thermal conductivity measurements of diamond thin films," Diamond and Related Materials, 15, 389-393, 2006. W.-S. Huang, D.T. Tran, J. Asmussen, T.A. Grotjohn, and D. Reinhard, "Synthesis of thick, uniform, smooth ultrananocrystalline diamond films by microwave plasma-assited chemical vapor deposition," Diamond and Related Materials, 15, 341-344, 2006. T.A. Grotjohn, R. Liske, K. Hassouni, and J. Asmussen, "Scaling behavior of microwave reactors and discharge size for diamond deposition," Diamond and Related Materials, 14, 288-291, 2005. D.K. Reinhard, T.A. Grotjohn, M. Becker, M.K. Yarn, T. Schuelke, and J. Asmussen, "Fabrication and properties of ultranano, nano, and microcrystalline diamond membranes and sheets," The Journal of Vacuum Science & Techology, B15, pp. 2811-2817, 2004. T. Ohshina, T. Ikegami, K. Ebihara, J. Asmussen, R. Thareja, "Synthesis of p-type ZnO thin films using co-doping techniques based on KrF excimer laser deposition," Thin Solid Films, 435, 49-55, 2003. A.L. Vikharev, A.M. Gorbachev, V.A. Koldanov, R.A. Akmedzhanov, D.B. Radishchev, T.A. Grotjohn, S. Zuo, and J.Asmussen, "Comparison of pulsed and CV regimes of MPACVD reactor operation," Diamond and Related Materials, 12, 272-276, 2003. B. Bi, W.-S. Huang, J. Asmussen and B. Golding, "Surface acoustic waves on nanocrystalline diamond," Diamond and Related Materials, 11, pp. 677-680, 2002. V.M. Ayres, M. Farhan, D. Spach, J. Bobbitt, J. Abdal Majeed, B.F. Wright, B.L. Wright, J. Asmussen, M. Kanatzidis and T.R. Bieler, "Transitions observed in nitrogen/methane/hydrogen depositions of polycrystalline diamond films," Journal of Applied Physics, 89, pp. 6062-6068, 2001. J.K. Park, V.M. Ayres, J. Asmussen, and K. Mukherjee, "Precision micromachining of CVD diamond films," Diamond and Related Materials, 9, pp. 1154-1158, 2000. V.M. Ayres, T.R. Bieler, M.G. Kanatzidis, J. Spano, S. Hagopian, H. Balhareth, B.F. Wright, M. Farhan, J. Abdul Majeed, D. Spach, B.L. Wright, and J. Asmussen, "The effect of nitrogen on competitive growth mechanisms of diamond thin films," Diamond and Related Materials, 9, pp. 236-240. 2000. T.A. Grotjohn, J. Asmussen, J. Sivagnaname, D. Story, A.L. Vikharev, A. Gorbachev, and A. Kolysko, "Electron density in moderate pressure diamond deposition discharges," Diamond and Related Materials, 9, pp. 322-327, 2000. Back to top Conference Papers and Proceedings (International and National Meetings): R. Ziervogel, M.F. Becker, T. Schuelke, J. Asmussen, T.A. Grotjohn and D.K. Reinhard, "Deposition uniformity of ultrananocrystalline diamond on 150 and 200 mm wafer substrates," presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006. S. Zuo, M.K. Yaran, T.A. Grotjohn, D. K. Reinhard, J. Asmussen, "Investigation of diamond deposition uniformity and quality for freestanding film and substrate applications," presented at the 17th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, September 3-8, Estoril, Portugal, 2006. T.A. Grotjohn, J. Narendra, J. Zhang, J. Asmussen and N. Xi, "Miniature microwave plasma discharge for local area materials processing," presented at the VI International Workshop on Microwave Discharges: Fundamentals and Applications, September 11-15, Zvenigorod, Russia, 2006. Also published in the VI Conference Proceedings, "Computer-integrated ion, free radical and UV light sources for micro-manufacturing work cell," pp. 263-269, edited by A. Lebedev, ISBN 5-8037-0343-5. K. Hemawan, C. Romel, S. Zuo, I. Wichman, T.A. Grotjohn, and J. Asmussen, "Plasma-assisted combustion in a miniature microwave plasma torch application," Gordon Research Conference on Plasma Processing Science, Massachusetts, Aug. 2006. J. Narendra, D. Tran, J. Zhang, T.A. Grotjohn, J. Asmussen, and N. Xi, "Miniature microwave plasma for localized etching," Gordon Research Conference on Plasma Science, Massachusetts, Aug. 2006. T. A. Grotjohn, J. Asmussen, S. Zuo, J. Narendra, "Scaling of microwave plasma sources to small dimensions," NSF DMI Grantees Conference, St. Louis, July, 2006. J. Narendra, D. Tran, J. Zhang, T.A. Grotjohn, J. Asmussen, N. Xi, "Miniature microwave plasma for localized etching," NSF DMI Grantees Conference, St. Louis, July, 2006. F. Marti, P. Miller, M. Becker, D. Tran, S. Zhou, J. Asmussen, T.A. Grotjohn and D. Reinhard, "Diamond electron stripping foils for high energy ion beams," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. S. Zuo, T.A. Grotjohn, D. Reinhard, and J. Asmussen, "Deposition and post-processing of polycrystalline diamond for freestanding films and substrates," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. R. Ziervogel, M.K. Yaran, M. Becker, T. Schuelke, and J. Asmussen, "Deposition of ultrananocrystalline diamond on 6 and 8 inch diameter wafer substrates using a 915 MHz plasma assisted CVD Diamond Reactor," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. D.T. Tran, T.A. Grotjohn and J. Asmussen, "Synthesis of ultrananocrystalline diamond films by a microwave plasma-assisted chemical vapor deposition system," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. J. Narendra, Y. Gu, J. Zhang, T.A. Grotjohn, N. Xi, and J. Asmussen, "Local area materials etching using microstripline-based miniature microwave discharge," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. K.W. Hemawan, C.L. Romel, S. Zuo, T.A. Grotjohn, I.S. Wichman, and J. Asmussen, "Plasma-assisted combustion in a miniature microwave plasma torch applicator," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI., 2006. M.A. Perrin, T.A. Grotjohn, D. Reinhard, J. Asmussen, and J. Wander, "Evaluation of an end feed microwave cavity plasma source for diamond etching," presented at the 2006 IEEE International Conference on Plasma Science, June 4-8, Traverse City, MI,. 2006. K.W. Hemawan, C.L. Romel, S. Zuo, I.S. Wichman, T.A. Grotjohn, and J. Asmussen, "Microwave plasma-assisted premixed flame combusionstion," presented at the Central States Section Meeting of the Combustion Institute, Cleveland, 2006. T.A. Grotjohn, D.T. Tran, and J. Asmussen, "Synthesis and characterization of nanocrystalline diamond films including conducting films," Joint International Conference on New Diamond Science and Technology and The Applied Diamond Conference, Research Triangle Park, NC., May 15-19, 2006. J. Narendra, D. Tran, J. Zhang, T. Grotjohn, J. Asmussen, and N. Xi, "Local area materials processing using a microstipline-based miniature microwave discharge," presented at the 3rd International Workshop on Microplasmas, Greifwald, Germany, May 9-11, 2006. K.W. Hemawan, S. Zuo, C.L. Romel, I.S. Wichman, T.A. Grotjohn, and J. Asmussen, "Microwave Plasma-assisted Premixed Flame Combustion," presented at the 3rd International Workshop on Microplasmas, Greifswald, Germany, May 9-11, 2006. J. Asmussen, "Microwave plasma-assiste Diamond Sythesis: A brief review of the last twenty years and a vision of the future," Invited paper, presented at the 2006 Interational Conference on Metallurgical Coatings and Thin Films, San Diego, CA., May, 1-5, 2006. Back to top Books and/or Book Chapters: J. Asmussen and D. Reinhard, editors of Diamond Film Handbook, Marcel Dekker in 2002. J. Asmussen also contributed Chapter 7 with T. Grotjohn entitled, "Microwave Plasma-Assisted Diamond Film Deposition," pp. 211-302. O. Popov, High Density Plasma Sources, 1996 Noyes Publishing, N.J., (J. Asmussen contributed Chapter 6 entitled, "Microwave Plasma Disk Reactor Processing Machines," pp. 251-308). J. Asmussen, "Plasma processing," McGraw-Hill Yearbook of Science and Technology, Copyright 1992, McGraw-Hill Book Company, pp. 353-356. S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Handbook of Plasma Processing Technology, 1990 Noyes Publishing, N.J. (J. Asmussen contributed Chapter 11, entitled "Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition," pp. 285-307). Patents: J. Asmussen, "A high pressure microwave plasma CVD reactor," disclosed to the MSU Intellectual Property Office on January 23, 2006, MSU ID 06-076. J. Asmussen, T. Grotjohn, and N. Xi, "Process and Apparatus for Modifying a Surface in a work region," MSU 4.1-740; ID 04-038; U.S. Patent applied for June 15, 2006. T.A. Grotjohn, N. Xi, and J. Asmussen, "Micro and nanoscale ion, free radical and UV light sources," invention disclosure submitted to the MSU IP office in September 2004, MSU 4.1-740. J. Asmussen, T.A. Grotjohn, S. Zuo and K. Hemawan, "Miniature microwave plasma torch application and method of use thereof," disclosed to MSU in November 2003; a provisional patent application was filed at the Patent and Trademark Office on April 7, 2004; MSU 4.1-681. |
| Research |
Dr. Asmussen's scholarly interests include applications of microwave discharges, plasma processing, the theory, modeling and development electron cyclotron resonance plasma, ion and free radical sources, plasma assisted thin film deposition and etching, plasma assisted CVD synthesis of diamond and diamond film applications, microwave sintering and curing of materials, development of industrial plasma and material processing machines. |
| Teaching |
ECE 850: "Electrodynamics of Plasmas" - Spring 2007, 2003 ECE 989A"Plasma Processing" - Spring 2004 |