Nanoscale materials with unique mechanical, electronic, optical and chemical properties have a variety of potential applications such as nanoelectromechanical systems (NEMS) and nanosensors. The development of nanomanufacturing technologies will lead to potential breakthroughs in manufacturing new revolutionary industrial products. The techniques for nanomanufacturing can be generally classified into “bottom-up” and “top-down” methods. Self-assembly in nanoscale is reported as the most promising “bottom-up” technique, which is applied to make regular, symmetric patterns of nanoparticles. However, many potential nanostructures and nanodevices are asymmetric, which cannot be manufactured using self-assembly only. A “top-down” method would be desirable to fabricate complex nanostructures. Atomic force microscopy (AFM) ( Binning, et al 1986) has been proven to be a powerful technique to study sample surfaces down to the nanometer scale. Not only can it characterize sample surfaces, it can also modify the sample surface through manipulation (Schaefer and et al, 1995; Junno and et al, 1995), which is a promising ``top-down'' nanofabrication technique. The main problem of current AFM based nanomanipulation is the lack of real-time visual feedback because the same tip is used for both imaging and manipulation. The result of each operation has to be verified by a new image scan before the next operation. Obviously, this scan-design-manipulation-scan cycle is time consuming and not conducive to principles of mass production, rendering mass manufacturing impossible.