Micro and Nano Engineering Facility (MNEF)

ERC Cleanroom

The Micro and Nano Engineering Facility is located in room C16E in the Division of Engineering Research Building.  This is an 800 square foot facility that contains a number of class 100 work areas, and an overall class of approximately 10,000 environment.  It provides equipment for semiconductor wafer processing and lithography, including:

• Suss MJB3 submicron mask aligner

• Gaertner model 115B elipsometer

• Zeiss differential interference contrast microscope

• Diffusion furnances

• Photoresist spinner

• Wafer probing and test equipment (room C18)

• PlasmaQuest reactive ion etching (RIE) system

• Chemical etching wet station

• AXXIS Physical Vapor Deposition System (sputtering and e-beam)

Room Layout

Contacts for each System (training & maintenance)

Cleaning Parties

Rules of the Cleanroom

Standard Operating Procedures

User Fees

Safety Information

Associated Research Groups